A sample generation method and device

A technology for generating devices and samples, which is applied in the field of data processing, can solve the problems of large training loss, poor sample legitimacy and diversity, and low precision of deep learning models, achieving high legitimacy and diversity, and low training loss.

Active Publication Date: 2019-04-09
CHINA INFORMATION TECH SECURITY EVALUATION CENT
View PDF5 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention provides a sample generation method and device, which can solve the problem of the low accuracy of the deep learning model and the large training loss cau

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A sample generation method and device
  • A sample generation method and device
  • A sample generation method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0044] The present invention provides a sample generation method and device, which can solve the problem of the low accuracy of the deep learning model and the large training loss caused by the neural network training with the two-layer LSTM model in the prior art, which leads to the legality and safety of the final generated samples. The problem of poor diversity.

[0045] Such as figure 1 As shown, the embodiment of the present invention discloses a sample gen

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a sample generation method and device. The method comprises the steps: inputting data in a pre-collected training set into a neural network model, obtaining a sample generationmodel, and enabling the neural network model to be a neural network model employing an attention mechanism; Inputting pre-collected data in the test set into the sample generation model to generate asample. According to the invention, a neural network model of an attention mechanism is adopted; the neural network model can endow characters in the input data with different weights; Therefore, data information in the input data can be learned more selectively, data with high correlation with the current output data in the input data can be found, a high-precision deep learning model can be finally obtained, training loss is low, and samples generated by the high-precision deep learning model are inevitably higher in legality and diversity.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner CHINA INFORMATION TECH SECURITY EVALUATION CENT
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap