Ultraviolet light emitting diode epitaxial wafer and manufacturing method thereof
A technology of light-emitting diodes and manufacturing methods, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of low internal quantum luminous efficiency of diodes and easy migration of electrons, so as to improve internal quantum efficiency, improve radiation recombination efficiency, and improve Effect of Crystal Quality
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[0028] In order to make the objects, technical solutions and advantages of the present disclosure, the present disclosure will be further described in detail below with reference to the accompanying drawings.
[0029] figure 1 It is a schematic structural diagram of an ultraviolet light emitting diode extension provided by the embodiment of the present disclosure, such as figure 1 As shown, the ultraviolet light emitting diode epitaxial piece includes a substrate 1, and a buffer layer 2, a buffer layer 2, an unpowed AlGaN layer 3, an N-type layer 4, an active layer 5, and a p-type layer 6 in sequentially laminated on the substrate 1.
[0030] The ultraviolet light emitting diode also includes an electronic restriction layer 7 disposed between the active layer 5 and the P-type layer 6, the electronic restriction layer 7 is an AlGaN / MGN / INAlGan / MGN / AlN structure.
[0031] That is, the electronic restriction layer 7 includes an AlGaN layer, an MGN layer, an INALGAN laye
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