A
semiconductor-on-insulator structure and a method of forming the
silicon-on-insulator structure including an integrated
graphene layer are disclosed. In an embodiment, the method comprises
processing a
silicon material to form a
buried oxide layer within the
silicon material, a silicon substrate below the
buried oxide, and a silicon-on-insulator layer on the
buried oxide. A
graphene layer is transferred onto the silicon-on-insulator layer. Source and drain regions are formed in the silicon-on-insulator layer, and a gate is formed above the
graphene. In one embodiment, the
processing includes growing a respective
oxide layer on each of first and second silicon sections, and joining these silicon sections together via the
oxide layers to form the silicon material. The
processing, in an embodiment, further includes removing a portion of the first silicon section, leaving a residual silicon layer on the bonded
oxide, and the graphene layer is positioned on this residual silicon layer.