The invention relates to an amorphous silicon image sensor with a storage capacitor structure, comprising a plurality of pixel units. Each pixel unit comprises a grid wiring, a first insulating layer, an active layer, a data wiring, a second insulating layer, a storage capacitor, a photosensitive diode, a passivation layer and a bias voltage wire, wherein the storage capacitor is arranged below the photosensitive diode; a lower electrode of the storage capacitor is formed on a glass substrate or the first insulating layer, and an upper electrode of the storage capacitor is formed on a dielectric layer and connected with a source electrode; a first electrode of the photosensitive diode is in co-electrode with the upper electrode of the storage capacitor; and a second electrode of the photosensitive diode is conductive with the lower electrode of the storage capacitor and the bias voltage wire. By means of the amorphous silicon image sensor disclosed by the invention, the charge storagecapacity of the pixel units is increased under the condition of not enlarging or reducing pixel dimensions by arranging the storage capacitor below the photosensitive diode, and therefore the purposeof enhancing the signal dynamic range of a thin film transistor matrix panel under the precondition of not losing the resolution ratio of the thin film transistor matrix panel is achieved.