Sample generation method, device and equipment

A sample and attention technology, applied in the field of machine learning, can solve the problems of small number of samples and insufficient balance of features, and achieve the effect of improving accuracy and improving balance

Pending Publication Date: 2022-07-22
ALIPAY (HANGZHOU) INFORMATION TECH CO LTD +1
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in some occasions, due to objective circumstances, the number of sampl

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sample generation method, device and equipment
  • Sample generation method, device and equipment
  • Sample generation method, device and equipment

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0038] The embodiments of this specification provide a sample generation method, apparatus, device, and storage medium.

[0039] In order to make those skilled in the art better understand the technical solutions in this specification, the technical solutions in the embodiments of this specification will be clearly and completely described below with reference to the accompanying drawings in the embodiments of this specification. Obviously, the described The embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments of the present specification, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present application.

[0040] figure 1 A schematic flowchart of a sample generation method provided by one or more embodiments of this specification. The method can be applied to different business fields, such as artifici

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The embodiment of the invention discloses a sample generation method, device and equipment. According to the scheme, according to article features and attention features of users for the article features, a first preference score of a first sample user for a first article and a second preference score of the first sample user for a second article are predicted through a model, and the first preference score is higher than the second preference score; according to a set attention disturbance parameter, adjusting the attention feature of the first sample user, and according to the adjusted attention feature, updating the first preference score and the second preference data; learning a target value of the attention disturbance parameter by taking reduction of a gap between the updated first preference score and the second preference score as a target; and under the target value, if the updated first preference score is lower than the second preference score, generating a second sample user for training the model according to the adjusted attention feature.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner ALIPAY (HANGZHOU) INFORMATION TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products