Preparation method of simple substance nano powder through plasma chemical vapor reactions

A technology of chemical gas phase reaction and nano-powder, which is applied in the direction of nano-technology, boron/boride, silicon, etc., can solve the problems of low yield of nano-powder, high impurity content, coldness reduction, etc., and achieve particle size and uniformity Control and ensure the effect of high-purity characteristics

Inactive Publication Date: 2019-05-31
BEIJING MINING & METALLURGICAL TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patented technology allows for easy production of various type elements such as nanoparticles that have specific sizes or shapes. It also includes methods like reducing temperature during this step, controlling the amount produced per unit time, and protective atmospheres from harmful substances. These technical benefits make it possible to create highly pure products at an affordable cost compared to previous techniques.

Problems solved by technology

Technological Problem: Current methods involve expensive processes like ball mill mixing with coarse metallic powders, sputtering, arc fusion, fast quenching, laser vaporization condensations, and others, while also being limited in terms of reproducibility and producing smaller sizes of these products. There has developed an improved way called plasmonics (plasmacy), where tiny elements made from thin films deposited onto substrates provide better control over production parameters compared to current methods.

Method used

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  • Preparation method of simple substance nano powder through plasma chemical vapor reactions
  • Preparation method of simple substance nano powder through plasma chemical vapor reactions

Examples

Experimental program
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Effect test

Embodiment 1

[0022] Plasma chemical gas phase reaction to prepare nano silicon powder, such as figure 1 Shown is the schematic diagram of the technological process that the example of the present invention prepares nano-silicon powder:

[0023] Before the reaction starts, turn on the cooling water of the equipment, feed argon, and set the nitrogen flow rate to 2.7m 3 / h, after the arc strike is stable, set the hydrogen flow rate to 2.0m 3 / h, turn off nitrogen.

[0024] high purity SiCl 4 The raw material is passed into the plasma high-temperature zone, and the plasma power is adjusted to 35kw to make SiCl 4 and H 2 Gas phase reduction reaction occurs: SiCl 4 +H 2 →Si+HCl, the generated high-purity silicon vapor passes through the cooling zone under the action of argon, the temperature of the cooling zone is set to 30°C, the corresponding powder is formed through condensation nucleation, and finally the corresponding powder is obtained through the powder separation and collection de

Embodiment 2

[0027] Preparation of nano boron powder by plasma chemical vapor reaction.

[0028] Before the reaction starts, turn on the cooling water of the equipment, feed argon, and set the nitrogen flow rate to 3.0m 3 / h, after the arc strike is stable, set the hydrogen flow rate to 2.0m 3 / h, turn off nitrogen.

[0029] high purity BCl 3 The raw material is passed into the plasma high-temperature zone, and the plasma power is adjusted to 38kw to make the BCl 3 and H 2 A gas phase reduction reaction occurs: BCl 3 +H 2 →B+HCl, the generated high-purity boron vapor passes through the cooling zone under the action of argon, the temperature of the cooling zone is set to 25°C, the corresponding powder is formed through condensation nucleation, and finally the corresponding powder is obtained through the powder separation and collection device. of nanopowders.

[0030] The boron content of the prepared nano boron powder is 99.9%, and the particle size of the nano boron powder is 50-8

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Abstract

The invention discloses a preparation method of simple substance nano powder through plasma chemical vapor reactions, and belongs to the technical field of new material preparation. According to the preparation method, plasma is taken as the heat source, high purity raw material gas is introduced into a plasma high temperature area, the high purity raw material gas and hydrogen carry out gas phasereduction reactions: MClx+H2=M+HCl; generated high purity single substance steam (M) is carried by carrier gas to go through a cooling area, through rapid condensation nuclei, corresponding powder isformed; and finally single substance nano powder is obtained by a powder separating-collecting device. The purity of the simple substance nano powder prepared by the provided method is high, and theparticle size is 100 nm or less and is controllable.

Description

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Claims

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Application Information

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Owner BEIJING MINING & METALLURGICAL TECH GRP CO LTD
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