Plasma chamber arc suppression method and device and radio frequency power supply system

A plasma and plasma technology, applied in the field of radio frequency system measurement and control, can solve the problem of low reliability of arc suppression, and achieve the effect of avoiding false detection behavior, strong adaptability, and avoiding missed detection and false detection.

Pending Publication Date: 2022-08-09
深圳市恒运昌真空技术有限公司
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  • Abstract
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  • Claims
  • Application Information

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Benefits of technology

This patented technology helps prevent damage from electric discharges during manufacturing processes used for semiconductors such as integrated circuits (IC). By analyzing data collected through reflection or sputtering techniques, it can identify which type of electrical activity has occurred at specific points within the process. If no problem occurs, this analysis suggests that other areas are being affected more heavily than others due to factors like voltage fluctuations or temperature changes. However if problems occur, these issues affect certain parts of the IC's design causing them to malfunction. To solve this issue, advanced technologies have been developed specifically designed into the chip itself. These advancements aim to improve its performance while reducing costs associated with production.

Problems solved by technology

This patented describes an issue with existing methods of prevention or reduction of arcing during high-frequency radio frequency power supplies when generating arcs due to changes in voltages/currents caused by sudden fluctuations in electricity usage over time. Existing techniques are prone to failure because they rely solely upon detectable differences between actual values and thresholds set points.

Method used

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  • Plasma chamber arc suppression method and device and radio frequency power supply system
  • Plasma chamber arc suppression method and device and radio frequency power supply system
  • Plasma chamber arc suppression method and device and radio frequency power supply system

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Embodiment Construction

[0046] In order to make the objectives, technical solutions and advantages of the present application more clear, the present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application, but not to limit the present application.

[0047] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this application belongs. The terms used herein in the specification of the application are for the purpose of describing specific embodiments only, and are not intended to limit the application.

[0048]It should be noted that reference herein to "an embodiment" means that a particular feature, structure or characteristic described in connection with the embodiment may be included in at least one embod

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Abstract

The invention relates to a plasma chamber arc suppression method and device and a radio frequency power supply system. The method comprises the following steps: carrying out arc detection on a plasma chamber; the arc detection comprises reflectivity detection, slope detection and pressure detection; determining whether electric arc is generated in the plasma chamber according to any one of reflectivity detection, slope detection and pressure detection; if the electric arc is generated, performing variable inductance adjustment on an access inductor of a main loop connected in series in the plasma chamber according to the severity of the generation of the electric arc, and suppressing the electric arc in the plasma chamber; according to the variable inductance adjustment mode, the inductance values of the connected inductors are correspondingly adjusted from small to large according to the sequence from light to heavy of the severity degree of electric arc generation. High-reliability detection on whether electric arc is generated in the plasma chamber is realized by adopting a mode of combining multiple detection means, and electric arc suppression is carried out by adopting an inductance changing mode, so that the aim of greatly improving the suppression reliability of the electric arc in the chamber is fulfilled.

Description

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Claims

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Application Information

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Owner 深圳市恒运昌真空技术有限公司
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