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1 results about "Copper substrate" patented technology

Copper oxide as a "self-cleaning" substrate for graphene growth. Abstract. Commonly used techniques for cleaning copper substrates before graphene growth via chemical vapor deposition (CVD), such as rinsing with acetone, nitric, and acetic acid, and high temperature hydrogen annealing still leave residual adventitious carbon on the copper surface.

Super-clean graphene and preparation method thereof

ActiveCN108069416ASimple structureRaw material safetyGrapheneGraphiteGraphene
The invention discloses super-clean graphene and a preparation method thereof. The preparation method of the super-clean graphene comprises the following steps: putting foam copper on a copper substrate, and attaching; leading carbon source gas and hydrogen to perform chemical vapor deposition; after deposition is completed, obtaining the super-clean graphene at the contact surface of the copper substrate and the foam copper. The preparation method has the advantages that the preparation method is simple and is suitable for large-scale production, the continuous clean area reaches the sub-centimeter level, and the preparation method is suitable for the fields of electronics, optics and the like.
Owner:PEKING UNIV
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