The invention provides a reaction chamber and a semiconductor processing device. The semiconductor processing device comprises a base, snap rings, a detecting device and an adjusting device, wherein the base is used for bearing a wafer; a negative bias is applied to the base when the base is processed; the edge area of the upper surface of the wafer is pressed by the snap rings; the detecting device is used for detecting the negative bias of the base in a real-time manner, and sending the negative bias to the adjusting device; and the adjusting device is used for adjusting the voltage of the snap rings according to the negative bias of the base so as to enable the negative bias of the base to be consistent with the voltage of the snap rings. The reaction chamber, provided by the invention, can ensure that the negative bias of the base is consistent with the voltage of the snap rings so as to avoid a problem that sparking is generated between the snap rings and the base.