This invention pertains to e lectronic / optoelectronic devices with reduced extended defects and to a method for making it. The method includes the steps of depositing a
dielectric thin film
mask material on a
semiconductor substrate surface; patterning the
mask material to form openings therein extending to the
substrate surface; growing active material in the openings; removing the
mask material to form the device with reduced extended defect density; and depositing
electrical contacts on the device.