Dual-beam parallel inscribing apparatus based on axial chromatic aberration of focusing lens

A dual-beam parallel inscribing apparatus based on axial chromatic aberration of a focusing lens comprises a first laser, a second laser, a first 1/2 wave plate, a second 1/2 wave plate, a first beam expander, a second bean expander, a first beam splitter, a second beam splitter, a first reflector, a second reflector, a third reflector, the focusing lens, a triangular prism, a first detector and a second detector. According to the present invention, two beams of light with different wavelengths are coupled into the same beam of light, the axial chromatic aberration is generated by the focusing lens, and the light is focused into different positions in the axial direction, i.e. the positions with different thicknesses on a photoetching material, so that simultaneous photoetching of double axial focuses is implemented. According to the dual-beam parallel inscribing apparatus, simultaneous storage of double beams can be implemented, the storage speed is doubled, the information storage capacity is also improved, and a basis is provided for popularization and application of a multilayer optical storage technology. The dual-beam parallel inscribing apparatus further has a real-time signal reading and inscribing system, thereby ensuring the inscribing accuracy.