Developing control system and development control method

A development control and developer technology, which is applied in photography, photolithography process of pattern surface, optics, etc., can solve the problems of affecting CD, difference in developing ability, affecting the picture quality of display panels, etc., and achieve the effect of improving picture quality

Active Publication Date: 2018-11-13
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF3 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the uniformity of CD is mainly improved by improving the uniformity of illumination, the chuck flatness, and the focal length of the exposure machine during the exposure process. Effective control is obtained, and in order to save the amount of developing solution TMAH (Tetramethylammonium Hydroxide) in the subsequent deve

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0023] The present invention will be described in detail below with reference to the drawings and embodiments.

[0024] See figure 1 , Is a schematic structural diagram of Embodiment 1 of the development control system of the present invention, and the development control system includes:

[0025] The first pipe 10 is connected to the developing tank 30 and used to transport the developing stock solution to the developing tank 30;

[0026] The second pipe 20 is connected to the developing tank 30 and used to transport the developing circulating liquid to the developing tank 30;

[0027] The developing tank 30 is used to contain the developing solution composed of the developing stock solution and the developing circulating solution;

[0028] The control device 40 is arranged between the first pipe 10 and the developing tank 30 and between the second pipe 20 and the developing tank 30, and controls the transmission of the developing stock solution and the developing circulating liquid to al

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a developing control system. The developing control system comprises a first pipeline, a second pipeline, a developing tank, a control device and a first adjusting device, wherein the first pipeline and the second pipeline are respectively connected with the developing tank; the developing tank is used for containing a developing solution; the control device is arranged between the first pipeline and the developing tank as well as between the second pipeline and the developing tank and is used for controlling a developing stock solution and developing circulating fluidto be transmitted to the developing tank; the first adjusting device is connected with the developing tank and the control device; the control device is used for controlling the first adjusting deviceto transport a first adjusting solution to the developing tank through a third pipeline. The invention also discloses a developing control method. According to the method, the developing ability of the developing solution is controlled, the uniformity of CD is realized, and picture quality is improved.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products