Sliding instrument and method for manufacturing same
A technology for manufacturing methods and appliances, applied to chemical instruments and methods, skis, snowboards, etc., to achieve the effect of low frictional resistance and excellent gliding
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Embodiment 1
[0052] The slurry polishing composition used for polishing the test pieces of Examples 1 and 2 contained 20% by mass of silica having an average secondary particle diameter of 80 nm and 80% by mass of pure water (pH=10). The material of the polishing cloth used for polishing the test pieces of Examples 1 and 2 was suede. The slurry polishing composition used for polishing the test pieces of Examples 3 and 4 contained 18% by mass of alumina with an average secondary particle diameter of 3.0 μm and 82% by mass of pure water (pH=3). The material of the polishing cloth used for polishing the test piece of Example 3 and Example 4 was a nonwoven fabric. The slurry polishing composition used for polishing the test pieces of Comparative Example 1 and Comparative Example 2 contained 20% by mass of alumina with an average secondary particle diameter of 59.0 μm and 80% by mass of pure water (pH=6). The material of the polishing cloth used for polishing the test pieces of Comparative Exampl
Embodiment 5
[0070] The slurry polishing composition used for polishing the test piece of Example 5 contained 20% by mass of silica having an average secondary particle diameter of 80 nm and 80% by mass of pure water (pH=10). The material of the polishing cloth used for polishing the test piece of Example 5 was suede. The slurry polishing composition used for polishing the test piece of Example 6 contained 20% by mass of alumina having an average secondary particle diameter of 3.0 μm and 80% by mass of pure water (pH=6). The material of the polishing cloth used for polishing the test piece of Example 6 was a nonwoven fabric. The slurry polishing composition used for polishing the test piece of Example 7 contained 20% by mass of alumina with an average secondary particle diameter of 12.0 μm and 80% by mass of pure water (pH=6). The material of the polishing cloth used for polishing the test piece of Example 7 was non-woven fabric. The slurry polishing composition used for polishing the test
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