Double-sided cathode spiral ring gradual change type silicon drift detector and preparation method thereof

A silicon drift detector and helical ring technology, applied in the field of radiation detection, can solve the problems of limited application of electric field distribution, large dead zone area, limited sensitivity of detector array, etc., to improve sensitivity and radiation resistance performance, reduce Dead zone area, the effect of increasing the effective detection area

Pending Publication Date: 2019-06-11
湖南正芯微电子探测器有限公司
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a double-sided cathode spiral ring gradient silicon drift detector and a preparation method thereof, which solves the problem that the existing single-sided circular spiral ring detector array has a relatively large dead area

Method used

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[0040] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.

[0041] The double-sided cathode spiral ring graded silicon drift detector, as shown in Figures 2-9, is composed of a gradient detector unit front 7, a gradient detector unit back 8 and a high-resistance silicon substrate 14. The gradient detector unit front 7 and the back 8 of the gradient detector unit are respectively located on two opposite planes of the high-resistance silicon substrate 14; the front 7 of the gradient detector unit inclu

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Abstract

The invention discloses a double-sided cathode spiral ring gradual change type silicon drift detector and a preparation method thereof; the front surface of a gradual change type detector unit and theback surface of the gradual change type detector unit are positioned on two opposite planes of a high resistance silicon substrate; the front surface of the gradual change type detector unit comprises a first gradual change type P+ cathode spiral ring and an N+ collection anode embedded in the first gradual change type P+ cathode spiral ring, wherein the first gradual change type P+ cathode spiral ring is composed of a front circular region, a front gradual change region and a front square region; the back surface of the gradual change type detector unit comprises a second gradual change typeP+ cathode spiral ring, wherein the second gradual change type P+ cathode spiral ring is composed of a back circular area, a back surface gradual change region and a back surface square region; and amiddle electrode is arranged in the center of the second gradient type P+ cathode spiral ring. A silicon dioxide layer is generated on the surface of the N-type high-resistance silicon wafer througha gettering oxidation process, and the detector pattern is transferred to a silicon dioxide layer, and then etching and ion implantation and activation on each part are carried out; and finally the damage of the detector is repaired.

Description

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Claims

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Application Information

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Owner 湖南正芯微电子探测器有限公司
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