Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added

[0158]A 300-mL four-necked flask was charged with 41.98 g (0.161 mol) of N,N′-diphenyl-1,4-phenylenediamine (available from Tokyo Chemical Industry Co., Ltd.), 31.02 g (0.161 mol) of 4-amyloxybenzaldehyde (available from Tokyo Chemical Industry Co., Ltd.), 94.75 g (0.537 mol) of 4-(tert-butoxy)styrene (available from Wako Pure Chemical Industries, Ltd.), and 172.37 g of propylene glycol monomethyl ether (available from Kanto Chemical Co., Inc.). To the mixture was added 4.65 g (0.048 mol) of methanesulfonic acid (available from Tokyo Chemical Industry Co., Ltd.), and the resultant mixture was stirred and heated to 135° C. for dissolution and initiation of polymerization. After the elapse of 18 hours, the mixture was left to cool to room temperature, and then a solvent mixture of 1,000 g of methanol (available from Kanto Chemical Co., Inc.), 1,000 g of ultrapure water, and 100 g of 30% aqueous ammonia (available from Kanto Chemical Co., Inc.) was added to the mixture for reprecipitation

[0161]1.00 g of pDPPDA-AOBA-TBOS as a polymer, 0.20 g of 2,2-bis[3,5-bis[(2-methoxy-1-methylethoxy)methyl]-4-hydroxyphenyl]propane (compound prepared by dehydration and condensation of four methylol groups of Formula (4-20) with propylene glycol monomethyl ether, abbreviated as “PGME-BIP-A” and shown by Formula (5-1)) serving as a crosslinking agent, 0.020 g of pyridinium-p-phenolsulfonate serving as a crosslinking catalyst (acid catalyst), and 0.001 g of a surfactant (product name: MEGAFAC [trade name] R-30N, available from DIC Corporation, fluorine-containing surfactant) were dissolved in 7.00 g of propylene glycol monomethyl ether and 16.36 g of propylene glycol monomethyl ether acetate, to thereby prepare a resist underlayer film-forming composition.