Positive resist composition and patterning process,Functionalized carbosilane polymers and photoresist compositions containing the same

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2 results about "Acid labile" patented technology

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In the context of chemistry, acid labile means that an acidic proton is readily formed. For example, this can occur in molecules with a hydroxyl group with conjugated double bond capable of stabilising the anionic charge from extra electrons. This makes the acidic H+ easier to release, or more labile. Related QuestionsMore Answers Below.

Positive resist composition and patterning process

ActiveUS20100227273A1Increase contrastGood pattern profilePhotosensitive materialsRadiation applicationsPhotochemistryAcid labile

A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of acenaphthene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.

Positive resist composition and patterning process

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Owner:SHIN ETSU CHEM IND CO LTD

Functionalized carbosilane polymers and photoresist compositions containing the same

InactiveUS20090081597A1Photosensitive materialsRadiation applicationsLithographic artistSilanes

Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.

Owner:GLOBALFOUNDRIES INC

2 results about "Acid labile" patented technology

Positive resist composition and patterning process

Functionalized carbosilane polymers and photoresist compositions containing the same

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