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3 results about "Pendant group" patented technology

A pendant group (sometimes spelled pendent) or side group is a group of molecules attached to a backbone chain of a long molecule. Usually, this molecule would be a polymer. Pendant groups are different from pendant chains, as they are neither oligomeric nor polymeric.

Preparation method of ternary terbium complex monomer and copolymer luminescent material of ternary terbium complex monomer and MMA

InactiveCN105061481AImprove internal quantum efficiencyHigh color purityGroup 3/13 element organic compoundsLuminescent compositionsN dimethylformamideFluorescence
The invention relates to a preparation method of a ternary terbium complex monomer and a copolymer luminescent material of the ternary terbium complex monomer and MMA. The method comprises the steps that firstly, the ternary terbium complex monomer is prepared, and recrystallization is conducted on an initiating agent AIBN (azodiisobutyronitrile) through methyl alcohol; then the ternary terbium complex monomer is dissolved by utilizing DMF (N,N-dimethylformamide) and DMSO (dimethyl sulfoxide) or a toluene solvent respectively, wherein the molar ratio of the ternary terbium complex monomer to the MMA is 1-10 to 100, and the initiating agent AIBN accounts for 0.5%-1% of the total mass of an initiating system; after reaction is conducted for 20-60 h under the conditions that inert gas argon exists, water and oxygen do not exist, and the temperature ranges from 50 DEG C to 85 DEG C, copolymer powder is obtained through methyl alcohol reprecipitation. The copolymer can be used for electronic terminals such as computers, televisions and mobile phones and mainly serves as the luminescent material of the panel display field. In addition, due to the fact that a pendant group -N-H- of the copolymer contains a reactive hydrogen atom, the copolymer can be used for ion recognition and fluorescent probes.
Owner:CHONGQING UNIV OF TECH

Functionalized carbosilane polymers and photoresist compositions containing the same

InactiveUS20090081597A1Photosensitive materialsRadiation applicationsLithographic artistSilanes
Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
Owner:GLOBALFOUNDRIES INC
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