The invention discloses a method for preparing a solar cell silver wire grid electrode based on a photolithographic mask method and a liquid phase method. The method disclosed by the invention comprises the following steps: (1) a photoresist template is manufactured: photoresist is uniformly coated on the surface of a silicon substrate by using a spin-coating method, and designed specific graphics on a mask are copied on the silicon substrate through the steps of exposure, development, hardening and the like; (2) Ag particles are deposited by using a chemical method: an electrochemical reaction method is used for depositing the Ag particles on the photoresist template; (3) the photoresist template is removed: the photoresist is removed by using a photoresist remover; and (4) the annealing and sintering are carried out, and after the closely arrayed Ag particles are heated at high temperature, the Ag electrode is formed by mutual communication. The micron-level Ag electrode prepared according to the method has excellent electroconductive performance and a lower reflecting rate, moreover, the preparation process is simple, resource consumption is less, the Ag electrode can well replace a silk screen printed electrode, the efficiency of a solar cell can be improved, and the cost can be lowered.