Double-carrier exposure machine

An exposure machine and dual-stage technology, which is used in optomechanical equipment, microlithography exposure equipment, optics, etc., can solve the problems of slow transmission efficiency of photosensitive substrates and low production rate of exposure machines, so as to improve production speed and transmission. The effect of efficiency

Active Publication Date: 2019-08-27
CHIME BALL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Because the general exposure machine can only expose a photosensitive substrate in a single time; in addition, when a photosensitive substrate is exposed in the exposure machine, another photosensitive substrate often needs to be exposed before the previous photosensitive substrate and removed from the general exposure machine. After taking it out, another photosensitive substrate can be put into the exposure machine for exposure, resulting in slow transmission efficiency of the photosensitive substrate, which reduces the production rate of the exposure machine

Method used

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Example Embodiment

[0046] The dual stage exposure machine according to the embodiment of the present invention will be further described below in conjunction with the accompanying drawings.

[0047] See Figure 1 to Figure 4 , As shown in the figure: a dual-stage exposure machine of the present invention includes a conveying device 1, a light source generating device 2 and a feeding device 3.

[0048] The conveying device 1 includes a base 11, a first conveying mechanism 12, and a second conveying mechanism 13. The inner sides of the base 11 are respectively provided with a first driving unit 111 and a second driving unit 112 facing each other. The first conveying mechanism 12 has a first base 121, a first lifting unit 122, and a first carrying unit 123. The first base 121 is disposed on the first driving unit 111, and the first lifting unit 122 is disposed. On one side of the first base 121, the first carrying unit 123 is provided on the first lifting unit 122, and the second conveying mechanism 13 ha

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Abstract

The invention relates to the field of exposure instruments, in particular to a double-carrier exposure machine; the double-carrier exposure machine comprises a conveying device, a light source generating device and a feeding device, wherein the conveying device comprises a machine base, a first conveying mechanism and a second conveying mechanism; the machine base is provided with a first drivingunit and a second driving unit; the first conveying mechanism is provided with a first seat body, a first lifting unit and a first bearing unit; the second conveying mechanism is provided with a second seat body, a second lifting unit and a second bearing unit; the light source generating device is arranged above one side of the conveying device; and the feeding device is arranged on the other side of the conveying device. Therefore, when a photosensitive substrate is conveyed by the first conveying mechanism, the other photosensitive substrate can be conveyed by the second conveying mechanismto wait for exposure; and when the second conveying mechanism is used for conveying the other photosensitive substrate to wait for exposure, the first conveying mechanism is used for conveying another photosensitive substrate to wait for exposure, and the photosensitive substrates are conveyed circularly, so that the transmission efficiency of the photosensitive substrates and the production speed of the exposure machine are improved.

Description

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Claims

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Application Information

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Owner CHIME BALL TECH
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