Three-dimensional chiral nanometer anti-counterfeiting device and pattern manufacturing method

An anti-counterfeiting device and chiral technology, applied in the field of plasma optics, can solve the problems of insufficient encryption, and achieve the effects of low price, difficult imitation, and good application prospects

Inactive Publication Date: 2020-02-28
YANSHAN UNIV
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patented technology describes an improved way for creating unique images on surfaces that cannot easily replicate or falsify them without being copied. It achieves this through special structures made from two layers of materials with opposite handedness (symmetrical) colors arranged at 90 degrees angles). These structures are designed differently than regular colored pixels but still work well when viewed separately. They also allow for more complex designs such as spirally shaped lenses or holograms. Overall, these techniques help prevent counterfits and ensure secure documents like banknotes.

Problems solved by technology

The technical problem addressed by this patented technology relates to improving the performance of traditional colored print media used in laser printers (LBM) due to their high cost compared to alternative methods like liquid toners that require specialized equipment. This results in poor image quality when applied on documents containing these materials because they cannot be easily identified through visible light techniques alone. Plasmas offer an effective solution but current options lack sufficient protection against counterfeit/falsification measures.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Three-dimensional chiral nanometer anti-counterfeiting device and pattern manufacturing method
  • Three-dimensional chiral nanometer anti-counterfeiting device and pattern manufacturing method
  • Three-dimensional chiral nanometer anti-counterfeiting device and pattern manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0030] In order to overcome the shortcomings of the existing plasma optical encryption, the invention provides a three-dimensional chiral nanometer anti-counterfeiting device and a pattern making method.

[0031] In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0032] The

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
The inside diameter ofaaaaaaaaaa
Outer diameteraaaaaaaaaa
Heightaaaaaaaaaa
Login to view more

Abstract

The invention discloses a three-dimensional chiral nanometer anti-counterfeiting device and a pattern manufacturing method, and relates to the technical field of nanometer plasma optics. The method comprises: firstly, a three-dimensional chiral nanometer anti-counterfeiting structure block adopting a double-layer aluminum arc structure as a 3D chiral color pixel; secondly, adjusting the central angle of the double-layer aluminum arc structure, realizing the sRGB space function that the right-handed circularly polarized light color palette occupies 32% and the sRGB space function that the left-handed circularly polarized light color palette occupies 19%; arranging the three-dimensional chiral nanometer anti-counterfeiting structure blocks; the three-dimensional chiral nanometer anti-counterfeiting device formed by arrangement displaying different patterns under the irradiation of the left-handed circularly polarized light and the right-handed circularly polarized light. The defects of existing plasma optical encryption are overcome, and 3D chiral color printing has good application prospects in the aspects of optical safety and file authentication.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner YANSHAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products