Cleanser for Slit Coater, Slit Coater for Manufacturing Display Device and Manufacturing Method for Display Device

a technology of slit coater and cleaning solution, which is applied in the direction of detergent compositions, surface-active detergent compositions, chemistry apparatus and processes, etc., can solve the problem that the slit coater cannot be cleaned efficiently, and achieve the effect of efficient cleaning of the slit coater

Inactive Publication Date: 2008-02-14
SAMSUNG ELECTRONICS CO LTD
View PDF8 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The technical effect of this patented solution is that it provides a way to clean a slit coater effectively without having to stop working altogether.

Problems solved by technology

The technical problem addressed in this patent text relates to improving the efficiency of removing residue from a slit coater during replacement of colored fluorescent materials in LCD displays.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cleanser for Slit Coater, Slit Coater for Manufacturing Display Device and Manufacturing Method for Display Device
  • Cleanser for Slit Coater, Slit Coater for Manufacturing Display Device and Manufacturing Method for Display Device
  • Cleanser for Slit Coater, Slit Coater for Manufacturing Display Device and Manufacturing Method for Display Device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043]Hereinafter, exemplary embodiments of the present invention will be described with reference to accompanying drawings, wherein like numerals refer to like elements and repetitive descriptions will be avoided as necessary.

[0044]A slit coater according to an exemplary embodiment of the present invention will be described with reference to FIG. 1.

[0045]Referring to FIG. 1, a slit coater 1 comprises a slit nozzle 10, a color photosensitive liquid supplier 20 and a cleanser supplier 30. The slit coater 1 may further comprise a driver which allows the slit nozzle 10 to move on a plane.

[0046]The slit nozzle 10 is supplied with color photosensitive liquid from the color photosensitive liquid supplier 20 and discharges the supplied color photosensitive liquid on a substrate. The slit nozzle 10 will be described in further detail later herein.

[0047]The color photosensitive liquid supplier 20 comprises three color photosensitive liquid tanks 21a, 22a and 23a and mass flow controllers 21b, 2

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

Disclosed are a cleanser for a slit coater, a slit coater for manufacturing a display device and a manufacturing method for a display device. The cleanser for the slit coater comprises propylene glycol mono-methyl ether in an amount of about 70 to about 90 wt %, propylene glycol mono-methyl ether acetate in an amount of about 5 to about 20 wt %, and ethyl(3-ethoxy)propionate in an amount of about 5 to about 20 wt %.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner SAMSUNG ELECTRONICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap