Applicator and method for transferring dispersion liquid

a technology of liquid transfer and dispersion, which is applied in the direction of liquid degasification, separation processes, instruments, etc., can solve the problems of gas engulfing and spacer deformation or damage, and achieve the effect of gas generation

Active Publication Date: 2008-09-04
ULVAC INC
View PDF5 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0012]In order to solve the problems described above, the present invention provides an applicator for allowing a dispersion liquid of which solid microparticles are dispersed to land at a desired position on a substrate by relatively moving a head module and the substrate, including a first and a second circulation tanks placed outside the head module; a buffer tank provided in the head module; a discharge chamber having an inlet connected to the buffer tank; a main line provided between the first and second circulation tanks and the buffer tank; a return line provided between an outlet of the discharge chamber and the first and second circulation tanks; a feed valve provided on the main line for connecting at least one of the first and second circulation tanks to the buffer tank; and a return valve provided on the return line for connecting at least one of the first and second circulation tanks to the head module. The first and second circulation tanks and the buffer tank are hermetically sealed and the pressure of the space above the dispersion liquid placed in each of the tanks can be controlled.
[0025]Gas dissolution into the dispersion liquid and bubble generating are reduced because the dispersion liquid is not contacted with gases having pressures higher than the atmospheric pressure.
[0026]No gas is engulfed into the dispersion liquid by pumping and generating gas can be prevented because no pump is used for transferring the dispersion liquid.

Problems solved by technology

If the dispersion liquid is supplied by pumping, other problems (such as, engulfing of gas and deformation or damage of the spacer) occur.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038]Reference 11 in FIG. 9(b) represents an example of a applicator of the present invention including a platform 5 on which a substrate 7 is mounted.

[0039]A holding frame 20 is provided above the platform 5. The holding frame 20 has an ink head 21.

[0040]As shown in FIG. 1, the ink head 21 includes a plurality of head modules 21a, 21b, 21c. In the head modules 21a to 21c, buffer tanks 41a to 41c and discharge chambers 42a to 42c are provided, respectively.

[0041]The applicator 11 has a circulation system supplying a dispersion liquid to the head modules 21a to 21c. Reference 10 in FIG. 1 represents the circulation system, and a first circulation tank 31L and a second circulation tank 31R are provided in the circulation system 10.

[0042]The first and second circulation tanks 31L, 31R are placed at positions allowing the substrate 7 to be transported, for example, at lateral positions with respect to or below the platform 5, and they are fixed relative to the platform 5.

[0043]The buff...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention provides applicators reducing generating bubble. Dispersion liquid is supplied while the pressure of a circulation tank on the delivery side is lower than the atmospheric pressure but higher than the pressure of the space in buffer tanks. The dispersion liquid in the discharge chambers is recovered while the pressure in a circulation tank serving as recovery destination is lower than the atmospheric pressure. Gas dissolution can be reduced because the dispersion liquid does not come into contact with gases at pressures higher than the atmospheric pressure and engulffing gas or deformation of solid microparticles can be avoided because no pump is used.

Description

[0001]The present invention is a Continuation of International Application No. PCT / JP2006 / 321329 filed Oct. 26, 2006, which claims priority to Japan Patent Document No. 2005-325990, filed on Nov. 10, 2005. The entire disclosures of the prior applications are hereby incorporated by reference herein in their entireties.BACKGROUND[0002]The present invention generally relates to inkjet spacer applicators, especially to circulating spacer applicators.[0003]Recently, inkjet spacer applicators of which inkjet printer is adapted have been used to apply spacers for liquid crystal display.[0004]Reference 111 in FIG. 9(a) represents an example of a spacer applicator having an ink head 121 retained in a holding frame 120 above a platform 105, and a dispersion liquid of which spacers are dispersed is discharged from the ink head 121 while the ink head 121 and substrate 107 for a liquid crystal on the platform 105 are relatively moved along a scanning direction 109, whereby the dispersion liquid ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(United States)
IPC IPC(8): B05C5/00B05C11/10
CPCB41J2/175B41J2/18G02F1/13394G02F1/1303Y10T137/85954Y10T137/3127Y10T137/3115B05C11/10B05C5/00B05D1/26B05D3/00
Inventor NAMEKAWA, TAKUMIBABA, KEIINOUE, YUYAMURATA, MASAOHANE, KOJITAFF, ROBERT D.MCKAY, ROBERT R.FOX, RALPH D.
Owner ULVAC INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products