Ultralow-sheet-resistance metal aluminum film

A metallized aluminum, ultra-low-side technology, applied in the field of capacitors, can solve problems such as the inability to guarantee the reliability of capacitors, and achieve the effect of stable performance

Inactive Publication Date: 2013-05-01
TONGLING DONGSHI ELECTRONICS
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  • Description
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Problems solved by technology

Under the general atmospheric conditions on the ground, there will be no problem with the use of this metallized aluminum film, but in extreme environments such as space, where the temperature

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  • Ultralow-sheet-resistance metal aluminum film

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Embodiment Construction

[0019] In order to make the technical means, creative features, goals and effects achieved by the present invention easy to understand, the present invention will be further described below in conjunction with specific illustrations.

[0020] Such as figure 1 As shown, an ultra-low square resistance metallized aluminum film is composed of a base film 1 and a metallized aluminum film layer 2. The square resistance of the metallized aluminum film layer 2 is 0.25~0.65Ω / □, while the conventional metallized aluminum film The square resistance of the layer is 2~4Ω / □, that is, the thickness of the metallized aluminum film layer 2 is about 7 times that of the conventional metallized aluminum film, and the metallized aluminum film layer 2 is greatly thickened, which means that the vacuum evaporation metallization In the case of aluminum film, more aluminum should be deposited on the base film in the same time.

[0021] The base film 1 is an organic film, which can be selected as a po

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Abstract

The invention provides an ultralow-sheet-resistance metal aluminum film and relates to the technical field of capacitors. The ultralow-sheet-resistance metal aluminum film consists of a base film and a metal aluminum film layer. The sheet resistance of the metal aluminum film layer is 0.25-0.65 ohms per unit square. However, the sheet resistance of a conventional metal aluminum film layer is 2-4 ohms per unit square. In other words, the thickness of the metal aluminum film layer is approximate seven times of the thickness of the conventional metal aluminum film layer, the thickness of the metal aluminum film layer is greatly increased and more aluminum is deposited on the base film within the same time during vacuum evaporation of the metal aluminum film. The ultralow-sheet-resistance metal aluminum film provided by the invention has stable performance, is not deteriorated during long-term storage, can resist large-current impact, can be used in extreme environments such as outer spaces, and can endure conditions of severely changing temperature, high temperature, strong vibration, overweight, high radiation, zero gravity, microgravity and the like.

Description

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Claims

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Application Information

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Owner TONGLING DONGSHI ELECTRONICS
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