Designing method of vortex beam mask with oblique-line compressed phase step

A technology of vortex beam and phase step, which is applied in the direction of optics, optical components, instruments, etc., to achieve the effect of broadening the richness

Active Publication Date: 2019-03-19
HENAN UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patents describes how it works that uses computerized techniques for creating special patterns on surfaces called particles or other objects like DNA molecules. These patterned structures are useful because they allow them to manipulate their own properties without being affected by external forces such as gravity waves or magnetic fields. They also provide valuable applications related to quantum mechanics (QM).

Problems solved by technology

This patents discuss how quantum mechanics plays an essential role during interactions between matter waves (opticals). There are many ways we use this phenomenon: it allows us to control things like atoms or molecules with specific properties through their interaction with electromagnetic radiation. By controlling these characteristics, scientists have been able to create various devices such as sensors, detectable markers, and even robots.

Method used

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  • Designing method of vortex beam mask with oblique-line compressed phase step
  • Designing method of vortex beam mask with oblique-line compressed phase step
  • Designing method of vortex beam mask with oblique-line compressed phase step

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Embodiment

[0033] Taking a mask with a size of 512×512 as an example, a vortex beam mask with obliquely compressed phase steps is given for a laser with a working wavelength of 532nm. The value of the topological charge of the mask is m=5, the slope of the compressed slope K=0.2~0.5, and the value of the first phase step is a 1=1.019π, according to the transmittance function of the mask in the specific embodiment, a vortex beam mask with oblique line compressed phase steps is finally obtained. figure 1 The vortex beam mask for the obliquely compressed phase step is given. This vortex beam mask with obliquely compressed phase steps can be realized by a spatial light modulator. Take the PLUTO-VIS-016 phase spatial light modulator of German Holoeye Company as an example, its pixel size is 8 μm, the fill factor is 93%, and the resolution is 1920pixel×1080pixel. A continuous wave solid-state laser with a wavelength of 532nm and a power of 100mW was used in the experiment.

[0034] figure 2

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Abstract

The invention discloses a designing method of a vortex beam mask with an oblique-line compressed phase step. The method comprises the steps a remainder resolving function, a plane wave factor and a binary radial cut-off factor are combined to obtain a transmittance function T of the vortex beam mask, and the vortex beam mask with the oblique-line compressed phase step is obtained by substituting different selected parameter values of m, K and a1 into the transmittance function T. The vortex beam mask with the oblique-line compressed phase step can be generated through the mask produced by thedesigning method. The singularity of the vortex beam mask with the oblique-line compressed phase step is spirally distributed, the spiral level of the arrangement of the singularity is controlled by the gradient of a compressed oblique line, an unprecedented novel optical field mode distribution is provided, and the method has significant application value in the field of particular manipulating.

Description

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Claims

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Application Information

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Owner HENAN UNIV OF SCI & TECH
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