A platform leveling control method

A control method and platform technology, applied in the field of optical measurement, can solve the problems of affecting measurement efficiency, cumbersome operation, and low precision

Active Publication Date: 2021-08-13
GUANGDONG UNIV OF TECH
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This invention relates to an improved way to make sure that platforms are evenly distributed across their entire surface when they shouldn’t go too far or down from each other. It involves create patterns made with lights called interference bars which help distribute them more uniformly over different areas within the system. By measuring these patterns at specific angles along certain directions and controlling how well the devices inside the systems work based upon this measurement data, any issues like uneven distribution may have been identified earlier during production.

Problems solved by technology

This technical problem addressed in this patents relates to improves the stability and consistency of measurements performed through white light Interferometer (WLI) techniques for small parts such as electronic devices. Specifically, current methods require manual adjustment of the platforms after each measurement step due to their instabilities caused by tilting and unevenly distributed samples. Additionally, there are limitations associated with visual observation of variations in depth across different areas of the sample's surface being analyzed, leading to errors in analysis data obtained from these experiments.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A platform leveling control method
  • A platform leveling control method
  • A platform leveling control method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0049] A platform leveling control method provided in the present application is to extract the white light interference fringes by acquiring the white light interference fringe pattern of the measured sample on the platform, and calculate the direction angle and yaw angle of the measured sample according to the white light interference fringes, and then Calculate the displacement offset of the platform according to the direction angle and yaw angle, and then control the driving device of the platform to level the platform according to the displacement offset of the platform, which can replace manual leveling of the platform.

[0050] The following will clearly and completely describe the technical solutions of the embodiments of the present application with reference to the accompanying drawings. Apparently, the described embodiments are part of the embodiments of the present application, not all of them. Based on the embodiments in the embodiments of the present application, all

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present application discloses a platform leveling control method, including: acquiring the white light interference fringe pattern of the sample under test, extracting the white light interference fringe pattern according to the white light interference fringe pattern; obtaining the tilt of the measured sample according to the white light interference fringe pattern The orientation angle and the yaw angle; calculate the offset displacement parameter of the platform according to the orientation angle and the yaw angle, and adjust the driving device of the platform according to the offset displacement parameter. The application can calculate the displacement offset feedback of the platform according to the white light interference fringe pattern, and control the driving device of the platform to automatically level the platform, which can replace manual leveling of the platform.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner GUANGDONG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products