A measurement method and device for planar image analysis based on structural illumination features

A technology of image analysis and measurement method, which is applied in image analysis, image enhancement, image data processing, etc. It can solve the problems of lack of real-time performance and measurement accuracy, and achieve the effects of improving anti-interference performance, realizing recovery, and high accuracy

Pending Publication Date: 2021-01-15
WUHAN FENGHUO KAIZHUO TECH CO LTD +1
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This technology allows us to accurately recover depth values from images by adding extra detail that helps with slopes at different angles on an object being observed. It also prevents external lights like reflected sunlight and shadows from affecting how well it works when analyzing this scene. Overall, these technical improvements make our algorithms better than previous methods while still providing precise results over time.

Problems solved by technology

Technological Problem: Current Optical Three Dimensional Measurement (OMD), including laser scanning and imaging sensors like Liquid Crystal Display Devices (LCDS), have limited ability to accurately capture detailed depth information from targets due to their complex ghost structures caused by imperfections or motion blur during measurements. Existing techniques require expensive equipment and cannot provide timely results when needed.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A measurement method and device for planar image analysis based on structural illumination features
  • A measurement method and device for planar image analysis based on structural illumination features
  • A measurement method and device for planar image analysis based on structural illumination features

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] The principles and features of the present invention are described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.

[0037] refer to figure 1 and Image 6 , a measurement method for planar image analysis based on structured lighting features, comprising the steps of: S101. projecting stripes onto the surface of an object to be measured, and obtaining an EPI image of the object to be measured; S102. performing feature extraction on the EPI image to obtain a linear A line segment with obvious features; S103. identifying a collinear line segment belonging to the same feature point from the line segment with obvious linear features; S104. The relationship among them determines the coordinates of the three-dimensional scene of the feature points.

[0038] In step S101 of some embodiments of the present invention, the projecting the stri

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a measurement method and device for planar image analysis based on structural illumination features, and the method comprises the following steps: projecting stripes to the surface of a to-be-measured object, and obtaining an EPI picture of the to-be-measured object; performing feature extraction on the EPI picture to obtain line segments with obvious linear features; identifying collinear line segments belonging to the same feature point from the line segments with obvious linear features; and determining the coordinates of the three-dimensional scene of the feature point according to the collinear line segment and the relationship among the polar plane position, the straight line slope and the intercept in the EPI image. According to the invention, stripe analysisis carried out on stripe structured light projected to the surface of an object, noise is removed by using filtering and mathematical analysis methods, and an EPI reconstruction result based on structured illumination is optimized, so that the accuracy of a three-dimensional measurement result is improved, and the precision, stability and efficiency are improved to a certain extent.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner WUHAN FENGHUO KAIZHUO TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap