Ion-Doped Two-Dimensional Nanomaterials

Active Publication Date: 2020-03-26
NORTHEASTERN UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0009]Yet another aspect of the invention is an electronic device comprising the ion-doped nanomaterial or the p-n junction described above. The device can be, for example, a diode, transistor, field-effect transistor, tunneling field effect transistor, photovoltaic device, light-emitting diode, or solar cell. Still another aspect of the invention is a method of fabricating an ion-doped nanomaterial such as the two-dimensional nanomaterial described above. The method includes the steps of: (a) providing a two-dimensional material layered onto a surface of an insulating or semiconducting substrate, and two conductive pads deposited onto the two-dimensio

Problems solved by technology

Doping of two-dimensional materials is more difficult, due to more limited opportunities to fit doping elements into the crystal lattice.
However, addition of

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ion-Doped Two-Dimensional Nanomaterials
  • Ion-Doped Two-Dimensional Nanomaterials
  • Ion-Doped Two-Dimensional Nanomaterials

Examples

Experimental program
Comparison scheme
Effect test

example 1

Ion-Based Gating of Graphene.

[0062]Ion-exposure experiments were performed on a variety of nanomaterials, both under vacuum (P˜10−5 Torr, using Granville Phillips Ionization Gauge Model No. 274003, producing primarily N2+) as well as in open air (Ion Projector Model No. NIP-6E), the generated ion flux was directed from the ionization gauge towards the device); both conditions were found to be equally effective. FIGS. 2A-2D outline the results of ion-incidence experiments on a gated, 3-terminal graphene device (shown in FIGS. 2A, 2B), in which the metal-graphene contact area was covered with a photoresist layer to eliminate any contact-induced effect. If the incident positive ions were to absorb electrons from graphene, they would induce holes (i.e. p-type doping) that should right-shift the transconductance curves towards higher positive values. In contrast (FIG. 2C), starting with an intrinsically p-doped device, the exposure to incident positive ions led to the curves being left-shif

example 2

Ion-Based Gating of Molybdenum Disulfide in an FET Device.

[0063]FIGS. 3A-3E summarize an experiment similar to Example 1 but performed on a monolayer MoS2 FET device. A monolayer of atomically thin MoS2 was made by chemical vapor deposition, resulting in an optoelectronic grade crystalline quality film. WO2016 / 133570 describes methods of making ultrathin MoS2 films. As in the previous case, the contact areas were protected with photoresist prior to ion-exposure. In this study, the devices were tested with both positive and negative ions. Different devices were used to eliminate any “history” effect. FIGS. 3C and 3D show how the transfer characteristics shifted to the left (indicating n-type doping in case of positive ions) and to the right (indicating p-type doping in case of negative ions). The transfer curves recovered (as seen in FIG. 3D) after overnight release, indicating that the ions did not form any chemical bonds. The induced carrier density was estimated using the formula Δ

example 3

Stabilization of Ion-Doping by Addition of a Capping Layer.

[0064]Carrier-induction as demonstrated in Examples 1 and 2 remained effective as long as the ion source remained on, and stable doping levels could be achieved by controlling the source rate once the desired doping level had been achieved. However, while this approach was quite effective for investigating a variety of fundamental questions, for practical applications the doping effect must be stabilized.

[0065]Devices were capped with a freshly cured insulating polydimethylsiloxane (PDMS) thin film. FIGS. 4A-4E summarize the experimental results obtained where the release and recovery of the channel current in a set of devices using a single-wall carbon nanotube (SWNT) film; the devices were of similar geometry and resistance. The devices (shown in FIGS. 4A, 4B) were studied under various pressure and capping conditions over several days. In all devices, the channel current was monitored under a fixed bias (0.2V) after 2 mins o

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Electric potential / voltageaaaaaaaaaa
Login to view more

Abstract

Ion-doped two-dimensional nanomaterials are made by inducing electronic carriers (electrons and holes) in a two-dimensional material using a captured ion layer at the surface of the material. The captured ion layer is stabilized using a capping layer. The induction of electronic carriers works in atomically-thin two-dimensional materials, where it induces high carrier density of at least 1014 carriers/cm2. A variety of novel ion-doped nanomaterials and p-n junction-based nanoelectronic devices are made possible by the method.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner NORTHEASTERN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products