Substrate container with enhanced flow field therein
a technology of flow field and substrate, applied in the field of substrate containers, can solve the problems of reducing the number of substrates to be stored, weak or even stalling gas current above the first piece of substrate, and remaining moisture, dust and residual heat on the surface of the substrate, etc., and achieves enhanced flow field and enhanced flow field in the box.
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first embodiment
[0025]Referring to FIG. 1, in the present disclosure, a substrate container 100 with enhanced flow field therein comprises a box 1, at least one offset inflation mechanism 2 and at least one gas diffusion mechanism 3.
[0026]The box 1 has a front cover 11, a back panel 12 opposing the front cover 11, a bottom panel 13 connecting the front cover 11 and the back panel 12, and a top panel 14 connecting the front cover 11 and the back panel 12. The box 1 further has a plurality of lateral panels (not shown). The front cover 11, the back panel 12, the bottom panel 13 and the top panel 14 define an internal receiving space S.
[0027]Referring to FIG. 1 through FIG. 3 (FIG. 3 omits the back panel 12), an offset inflation mechanism 2 is disposed outside the internal receiving space S. The offset inflation mechanism 2 has a gaseous chamber 21 extends in the same direction as the bottom panel 13. One end of the gaseous chamber 21 has an inlet 211. The inlet 211 and the box 1 lie on two opposing s...
third embodiment
[0042]Referring to FIG. 8, in the present disclosure, the back panel 12, the partition walls 32b and the diffusion members 33b are integrally formed (or are kept airtight by any other means). The gaps 323b penetrate the partition walls 32b but are not disposed between the partition walls 32b. The pressurized gas exits the first gas channel 321b and enters the second gas channel 322b via the gaps 323b. Then, the pressurized gas flows to the front cover through the through holes 331b of the diffusion members 33b. The gaps 323b are made of a porous material.
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