The present invention provides a reliable, high-repetition rate,
production line compatible
high energy photon source. A very hot
plasma containing an active material is produced in
vacuum chamber. The active material is an
atomic element having an emission line within a desired
extreme ultraviolet (EUV) range. A pulse power source comprising a charging
capacitor and a magnetic compression circuit comprising a
pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV
light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.