4f phase imaging method for high sensitively measuring optical nonlinearity of material
A high-sensitivity measurement and optical nonlinear technology, which is applied in the field of optical nonlinear measurement of materials, can solve problems such as difficult to measure accurately and cannot meet the requirements of measurement, so as to improve the measurement sensitivity and solve the effect of easy damage
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[0022] The present invention will be further described below in conjunction with the drawings and embodiments:
[0023] See attached figure 1 As shown, a high-sensitivity 4f phase imaging method for measuring the optical nonlinearity of materials is composed of a beam splitter, a convex lens, a PO baffle, a ring attenuator, and a CCD detector. The pulsed laser is focused on the sample to be tested.
[0024] figure 2 It is a diagram of the experimental setup of the 4f phase imaging method for highly sensitive measurement of optical nonlinearity of materials. The experimental device can be divided into three parts: beam expanding system, measuring system and reference system. The beam expansion system is composed of a beam expander convex lens 2 and a collimating convex lens 3; the measurement system is composed of a PO baffle 4, a convex lens 7, a convex lens 10, an annular attenuator sheet 13, and a CCD detector 14; the reference system is composed of a half mirror 5 , The reflectin
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