Preparation method of transparent crystal orientation controllable anatase TiO2 nanotube array thin film

[0018] Example 1

[0019] (1) Cut the ITO conductive glass into ITO conductive glass pieces with a size of 10×33mm, and then ultrasonically clean the ITO conductive glass pieces with isopropanol, acetone and anhydrous methanol for 5 minutes, and then dry them with high-purity nitrogen;

[0020] (2) Put the ITO conductive glass sheet into the magnetron sputtering deposition system. Before the sputtering coating starts, the air pressure in the chamber is first pumped to 10 -3 Below mTorr, then fill the chamber with high-purity argon until the pressure reaches 10mTorr. The power used is a radio frequency power supply, the deposition power is 100W, the substrate temperature is 400℃, the DC bias is 10V, and the deposition reaction is 3h on the ITO conductive glass sheet Deposit (002) Ti film with crystal plane orientation;

[0021] (3) In the two-electrode system, the Pt electrode is used as the cathode, and the ITO conductive glass sheet deposited with the Ti film is used as the anode for a

[0023] Example 2

[0024] (1) Cut the ITO conductive glass into ITO conductive glass pieces with a size of 10×33mm, and then ultrasonically clean the ITO conductive glass pieces with isopropanol, acetone and anhydrous methanol for 5 minutes, and then dry them with high-purity nitrogen;

[0025] (2) Put the ITO conductive glass sheet into the magnetron sputtering deposition system. Before the sputtering coating starts, the air pressure in the chamber is first pumped to 10 -3 Below mTorr, then fill the chamber with high-purity argon until the pressure reaches 10mTorr. The power used is a radio frequency power supply, the deposition power is 100W, the substrate temperature is 400℃, the DC bias is 10V, and the deposition reaction is 3h on the ITO conductive glass sheet Deposit (002) Ti film with crystal plane orientation;

[0026] (3) In the two-electrode system, the Pt electrode is used as the cathode, and the ITO conductive glass sheet deposited with the Ti film is used as the anode for a

[0028] Example 3

[0029] (1) Cut the ITO conductive glass into ITO conductive glass pieces with a size of 10×33mm, and then ultrasonically clean the ITO conductive glass pieces with isopropanol, acetone and anhydrous methanol for 5 minutes, and then dry them with high-purity nitrogen;

[0030] (2) Put the ITO conductive glass sheet into the magnetron sputtering deposition system. Before the sputtering coating starts, the air pressure in the chamber is first pumped to 10 -3 Below mTorr, then fill the chamber with high-purity argon until the pressure reaches 10mTorr. The power used is a radio frequency power supply, the deposition power is 100W, the substrate temperature is 400℃, the DC bias is 10V, and the deposition reaction is 3h on the ITO conductive glass sheet Deposit (002) Ti film with crystal plane orientation;

[0031] (3) In the two-electrode system, the Pt electrode is used as the cathode, and the ITO conductive glass sheet deposited with the Ti film is used as the anode for a