Cavity lining device for improving PECVD (plasma enhanced chemical vapor deposition) cleaning efficiency

A technology of cleaning efficiency and lining, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of incomplete cleaning, deposition on the bottom of the cavity and the inner wall of the cavity, etc., to ensure the quality of the deposited film , Reduce film deposition and prevent glow discharge

Active Publication Date: 2021-12-03
江苏鲁汶仪器股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This technology improves the removal process for deposits on surfaces by reducing the amount of material that sticks out or gets stuck inside the chamber during use. It also includes adding an internal layer between two layers called liners made up of porcelain rings instead of traditional methods like sandwiches. Additionally, there are multiple tiny bumps at certain points along its surface where it's difficult to get ridged due to accumulated materials over time. These improvements help keep the equipment working properly even better without getting damaged more quickly than usual.

Problems solved by technology

This patented technical problem addressed in this patents relates to improving the performance of chemical vapour deposition processes used for creation of semiconductor devices such as transistors on silicon wafers during production or use thereof. Specifically, current methods have issues with excess buildup caused by accumulated materials left inside the device's interior after multiple cycles of high temperature processing steps like thermal oxidations. Additionally, these techniques also cause damage from particle contamination when removing layers formed through etchant chemistry.

Method used

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  • Cavity lining device for improving PECVD (plasma enhanced chemical vapor deposition) cleaning efficiency
  • Cavity lining device for improving PECVD (plasma enhanced chemical vapor deposition) cleaning efficiency
  • Cavity lining device for improving PECVD (plasma enhanced chemical vapor deposition) cleaning efficiency

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Embodiment 1

[0034] The optimal implementation scheme proposed in this embodiment is specifically as follows, a chamber lining device for improving PECVD cleaning efficiency, the basic structure of which is as described above. like figure 2 As shown, “a” in the figure is the diameter of the inner ring of the lining 30, “f” is the diameter of the inner ring of the cavity 10, and “s” is the distance between the gas uniform disk and the air extraction small hole 21. In this scheme, the diameter of the inner ring of the lining 30 (such as figure 2 The diameter of "a" shown in "a" and the inner ring of the ceramic ring 20 are both 240 mm, and the inner ring of the lining 30 extends axially downward to a height of 250 mm. The inner lining 30 is made of aluminum alloy, which has the advantages of easy processing, high yield, and low cost. The ceramic ring 20 is made of ceramics, which can prevent glow discharge from occurring in the gas distribution plate and the cavity 10. The ceramic ring 20 i

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PUM

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Abstract

The invention relates to a cavity lining device for improving PECVD (Plasma Enhanced Chemical Vapor Deposition) cleaning efficiency. The cavity lining device is arranged in a cavity and comprises a ceramic ring and a lining, the ceramic ring is nested above the lining, an annular air exhaust channel is formed among the ceramic ring, the lining and a cavity wall, and a plurality of small air exhaust holes are uniformly distributed on the periphery of the ceramic ring; the lining comprises an axial air exhaust channel, the axial air exhaust channel is arranged on the outer side of the lining, and the annular air exhaust channel communicates with the axial air exhaust channel; and the problem that the positions where plasmas cannot reach on the inner wall and the bottom of the cavity cannot be thoroughly cleaned is solved, the lining device can reduce the space of the cavity, it is guaranteed that the plasmas cover the inner wall and the bottom of the cavity, the small air exhaust holes are formed in the circle of the ceramic ring, it is guaranteed that reaction gas is evenly distributed in the cavity, the ceramic ring plays a role in insulation, the relative height of the small air exhaust hole in the cavity is controlled, and the cleaning effect and the quality of a deposited thin film are guaranteed.

Description

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Claims

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Application Information

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Owner 江苏鲁汶仪器股份有限公司
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