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3 results about "Integrated circuit manufacturing" patented technology

Method for model building based on changes of integrated circuit manufacture process performance

InactiveCN101154242AExact range of process performance variationsAccurately obtain the range of process performance variationSpecial data processing applicationsIntegrated circuit manufacturingV curve
The present invention discloses a building device model method based on the change of integrated circuit manufacturing procedure performance. Firstly, performance data of all transistors on a wafer are measured; crystal grains of a plurality of biggest discrete points are obtained by distributing statistics on the performance data. Then I-V properties of all the transistors of all crystal grains are measured to obtain a measuring I-V curve; model parameters are extracted from the measuring I-V curve. Next, the model parameters combining with the basic parameters of the transistors are input into a simulation software to obtain a simulation I-V curve through model building and simulation; the model parameters are debugged to make errors of the simulation I-V curve and the measuring I-V curve in a specified scope; finally the model satisfying the need of error is used as a performance-analysis model. Models produced by the model building method of the invention can reflect the scope of the device performance on the wafer deviating from a predicated value or a medium value more accurately, thereby helping designers predict the fluctuation of production technique and the deviation of device dimension.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
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