Compound biochip based on photon crystal

[0023] 1. First wash the ordinary glass slide with washing solution, then ultrasonically wash it with deionized water for 3 times, and dry it in a dust-free place for later use.

[0024] 2. Preparation method of silicon dioxide photonic crystal: control the particle size of silicon dioxide nanoparticles by temperature control method. For example, if the signal to be measured is cy3 and its emission wavelength is 570nm, adjust the temperature of the oil bath to 40 degrees, and select a fast gap Formula feeding method, first 88ml of absolute ethanol and 3.2ml of tetraethyl orthosilicate mixed solution and 20ml of ammonia water and 88ml of absolute ethanol mixed solution are added to the flask, and at the same time start stirring at a speed of 350 rpm; then add 16ml of ammonia water; after 5-10 minutes, add 176ml of absolute ethanol and 4ml of ethyl orthosilicate mixture. After reacting for 3 hours, silica nanoparticles with good monodispersity can be obtained. After centrifugal pu

[0028] 1. Preparation of the plastic sheet: firstly make a PS plastic sheet with a size of 76.2mm*25.4mm*1mm, and then cool it to room temperature. The plastic sheet was ultrasonically cleaned with deionized water, and its surface was oxidized with oxygen plasma.

[0029] 2. Preparation method of polystyrene photonic crystal: under the protection of nitrogen, add 10ml of styrene, 225ml of ultrapure water and 1ml of methacrylic acid into a three-necked flask, and stir at a speed of 350r / min. Raise the temperature to 70°C, add 0.32g of potassium persulfate as an initiator after stabilization, and react for at least 10 hours to obtain polystyrene microspheres with a particle size of about 245nm. After centrifugal purification, adjust the concentration of the microspheres to 2-2.5% with deionized water, and disperse them by ultrasonic. Fix the plastic sheet prepared in step 1 on the puller, and pull it up at a speed of 1.6um / s, and the microspheres will self-assemble into photon

[0032] 1. Preparation of silicon wafers: Clean the ordinary silicon wafers purchased, and oxidize the surface with oxygen plasma.

[0033] 2. Preparation of polymethyl methacrylate (PMMA) photonic crystal: The preparation of PMMA adopts a soap-free suspension polymerization method at boiling temperature. First put 40ml of methyl methacrylate into a narrow-necked bottle, add 0.1ml of methacrylic acid and 150ml of ultrapure water, heat to boiling under stirring, add initiator potassium peroxodisulfate 5 minutes after boiling, and react for 1.5 h. After centrifugal purification, adjust the concentration of microspheres to 2-2.5% with deionized water, and disperse them by ultrasonic. Fix the silicon wafer prepared in step 1 on the puller, and pull it up at a speed of 1.6um / s, and the microspheres will self-assemble into photonic crystals on the surface of the silicon wafer.

[0034] 3. The method of tiling the agarose membrane: as described in Example 1.