Catalytic material for catalyzing electrolytic water hydrogen evolution reaction under acidic condition, preparation method and application thereof

[0055]According to another aspect of the present invention, there is also provided a method for producing a catalytic material for catalyzing an electrolytic water reaction under acidic conditions, including step of: Step S1, an amorphous alloy film represented by the following chemical formula Elements are ingredients to obtain mixture: (IRaPTbPDc(Ti)dZreHFfNBgTAhMoiWj(FekCOlNimCUn), Where A, B, C, D, E, F, G, H, I, J, K, L, M, N are atomic scores of each element, and 20≤a + b + c ≤ 30, 30 ≤ D + E + F + G + H + I + J ≤ 50, 30 ≤ K + L + M + N ≤ 50, and A + B + C + D + E + F + G + H + i + J + K + L + M + N = 100; Step S2, smelting the mixture, obtaining the mother alloy; step S3, cooling the mother alloy to prepare a surface smooth alloy target; and step S4, with physical gas phase The deposition method deposits the alloy target to the substrate to form the amorphous alloy film to obtain a catalytic material for catalyzing electrolytic water in acidic conditions.

[0056]Specifically, in s

[0063]Example 1, the preparation of the Si sheet as a substrate, the amorphous alloy film is IR25Ni33TA42Catalytic material

[0064]The purity of the raw material was higher than 99.95 wt.% Platinum-based metal IR, then the transition metal Ni and the pre-transition metal TA were placed in a smelting pool of the electric arc furnace by 25:33:42, vacuum to less than 3 × 10-3PA, charged into argon. 5 times of smear, each smelting current is 320a, and the time of smelting is 30s, which is mixed and uniform, and the ingredient is accurate. The melt of the mother alloy is about 10 by the copper mold sampling device of the electric arc furnace.3K / S cooling speed vacuum co-casting into the copper mold to obtain a surface smooth alloy target. Sedimentary coating machine with ion beam sputtering in 2.5 × 10-2The argon ion energy of 750 eV, an ion beam flow 60 mA is hit by an ionic energy of 750 eV, and the coating time is 2 min, and the film thickness is 15 nm of the film is IR.25Ni33TA42Amorp

[0070]Examples 2 to 18, prepared from silicon as a substrate from a series of different ratios of amorphous alloy films

[0071]According to the method of Example 1, the amorphous alloy film having a film thickness of 15 nm of Si as a substrate was prepared by adjusting the ion beam flow and deposition time. These amorphous alloy films were used in the same treatment of electrolytic water under acidic conditions. Excessive potentials of each ratio of the aligned amorphous alloy film catalyst prepared in Examples 2 to 18 are listed in Table 1 below.

[0072]The amorphous alloy films prepared in Examples 2 to 18 have a wide range of diffusion peaks, and there is no significant crystallization peak, indicating that alloy film samples prepared by the methods of the present invention are amorphous.

[0073]Table 1

[0074] Serial number Amorphous alloy film component (at.%)10mA / cm 2 Overpot firm (MV)