High-temperature chemical vapor deposition system and equipment

The invention belongs to the technical field of production of semiconductor equipment, and provides a high-temperature chemical vapor deposition system and high-temperature chemical vapor deposition equipment. The high-temperature chemical vapor deposition system comprises an insulated heating barrel and a bottom box which is fixedly arranged at the bottom of the insulated heating barrel, wherein heating parts are arranged on the inner wall of the insulated heating barrel, and the heating parts can generate a heating temperature above 2000 DEG C; and a telescopic device which penetrates through the bottom of the insulated heating barrel is rotatably arranged in the bottom box, a rotating device for driving the telescopic device to rotate and a ventilation assembly which communicates with the insulated heating barrel are arranged in the bottom box, and the ventilation assembly can generate air flows, and can introduce the air flows into the insulated heating barrel. According to the high-temperature chemical vapor deposition system and high-temperature chemical vapor deposition equipment, through the heating parts, the interior of the insulated heating barrel is quickly heated, thus an internal reaction can be conveniently carried out more efficiently, the insulativity of the system is enhanced, damage caused by heat radiation to the outside world is prevented, and the insulated heating barrel can be quickly cooled after the reaction is completed, so that the chemical vapor deposition heating system is more complete.