Substrate processing apparatus
a processing apparatus and substrate technology, applied in the direction of electrical apparatus, liquid surface applicators, coatings, etc., can solve problems such as processing stoppage, and achieve the effect of improving operation efficiency
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[0024]In a best mode for carrying out the invention, a vertical substrate processing apparatus (simply called a processing apparatus hereafter) for performing oxidization / diffusion processing and CVD processing to a substrate is selected as a substrate processing apparatus, which is, for example, used as a processing apparatus in a manufacturing method of a semiconductor device (IC).
[0025]First, explanation will be given for the substrate processing apparatus according to an embodiment of the present invention, with reference to FIG. 1 and FIG. 2.
[0026]FIG. 1 is shown as a perspective of the substrate processing apparatus applied to the present invention. Also, FIG. 2 is a side perspective of the substrate processing apparatus shown in FIG. 1.
[0027]As shown in FIG. 1 and FIG. 2, FOUP (Front Opening United Pod. Called as pods hereafter) 110, being wafer carriers, are used in a substrate processing apparatus 100. A front maintenance port 103 is opened in front of a front side wall 111...
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