Apparatus and method for treating perfluoro-compound

[0031]FIG. 1 is a flow chart showing a method for treating a perfluoro-compound according to one embodiment of the present invention. Referring to FIG. 1, the treatment method for perfluoro-compounds (PFCs) is directed to a method of purifying PFCs contained in an exhaust gas emitted from, for example, a semiconductor manufacturing device.

[0032]The PFCs are used in the etching, cleaning, or deposition process of the semiconductor processing and may include any one processing gas, such as, for example, CF4, SF6, NF3, C2F6, C3F8, CHF3, etc.

[0033]The treatment method for PFCs comprises a first wet pre-treatment step S10, a second wet pre-treatment step S20, a wet filtering step S30, a wet dust-collecting step S40, a regenerative / catalytic reaction S50, a first wet post-treatment step S60, a second wet post-treatment step S70, and a discharging step S80, which steps S10 to S80 are sequentially conducted in succession.

[0034]In the first wet pre-treatment step S10, PFCs contained in the ex