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6 results about "Symmetric structure" patented technology

A symmetric structure is sub- jected to a loading that is anti- symmetric with respect to the structure’s axis of symmetry, the response of the structure is also antisymmetric. Displacement behavior along the axis of symmetry for antisymmetric loading results in no displacement along the axis of symmetry.

A multi-chip magneto-rheological soft start device

ActiveCN102297213AEasy to change sizeSimple structureConveyorsFluid clutchesMagnetorheological fluidEngineering
The invention discloses a multi-plate magnetorheological soft start device, which is characterized in that: a right shaft is in threaded connection with a right sealing disk; the outer ring of the right sealing disk is provided with a key groove which is matched with internal teeth of internal friction plates; a left shaft is in threaded connection with a left sealing disk; the left sealing disk is connected with a sealing ring through a screw; the inner ring of the sealing ring is provided with a key groove which is matched with external teeth of external friction plates; the internal friction plate and the external friction plates are alternately arranged; a magnet exciting coil is arranged between a left end plate and a right end plate; and the upper part of the right end plate is provided with a fluid injecting bolt, and the lower part of the right end plate is provided with a fluid discharging bolt. Magnetorheological fluid is taken as a working medium, the in-plate magnetic induction density is regulated by controlling the current of the magnet exciting coil, and the transmission torque is changed, so that the controlled soft start of heavy mechanical equipment is realized. The multi-plate magnetorheological soft start device has a hollow symmetrical structure, has high heat dissipation and high reliability and is convenient to operate.
Owner:苏州方德锐精密机电科技有限公司

Binary retention system for spherical polyelectrolyte brush and method for improving retention rate of paper pulp

InactiveCN105088859ASimple structureStrong shear resistanceRetention agents additionPolyelectrolyte brushesPapermaking
The invention provides a binary retention system for a spherical polyelectrolyte brush for improving the retention rate of paper pulp. The binary retention system is composed of a cationic spherical polyelectrolyte brush and anionic polyacrylamide, wherein the cationic spherical polyelectrolyte brush regards SiO2 as an inner core and a copolymer of acrylamide and methacryloyloxyethyl trimethyl ammonium chloride as an outer brush. The invention further provides a method for improving the retention rate by using the binary retention system. The method comprises: sequentially adding the binary retention system composed of the cationic spherical polyelectrolyte brush and anionic polyacrylamide into scattered paper pulp to improve the retention rate of the slurry. The cationic spherical polyelectrolyte brush provided by the invention has high symmetric or quasi-symmetric structures, so that the anti-shear ability is relatively strong. The system has both the characteristics of a highly branched structure and high charge density and is easily to induce flocculation in high speed papermaking so as to improve the retention performance of a modern papermaking system. The binary system adopted by the invention remarkably improves the retention rate of the paper pulp and is simple and convenient to operate and less in use level of auxiliaries.
Owner:WUHAN UNIV
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