Press welding method for semiconductor extension film

A technology of epitaxial wafers and semiconductors, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of slow heating rate, long cooling time, and affecting ohmic contact, and achieve fast heating rate, fast heating rate and cooling rate, and improved The effect of production rate

Inactive Publication Date: 2008-09-17
LATTICE POWER (JIANGXI) CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the InGaAlN film grown on the original substrate is made into a light-emitting device, there will be the following disadvantages: low utilization rate of the light-emitting material, poor heat dissipation, and the P-type transparent conductive layer has a certain absorption effect on light, thus affecting the photoelectricity of the device. There is a certain impact on performance
However, the metal has a large specific heat capacity, so its heating rate is slow and the heating time is long, which makes the bon

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0023] Construction embodiment one, see figure 1 Shown. First, an ohmic contact layer and a metal bonding layer (ie, a bonding metal to be bonded) are prepared on the InGaAlN epitaxial wafer 101, and an ohmic contact layer and a metal bonding layer are prepared on the substrate 102. If the substrate 102 is metal, there is no need to prepare an ohmic contact layer on the substrate 102. Of course, it is also possible that only the welding surface of the epitaxial wafer or one of the substrates has a pressure welding metal layer. The clamping device for applying pressure to the epitaxial sheet 101 and the substrate 102 includes a pressure member 107 and a pressure member 106. The source of the pressure of the pressing member 107 may be pressure transmitted by air pressure, or pressure transmitted by hydraulic pressure. In order to obtain high-quality welded products, the connection between the pressing member 107 and the pressure source member must be a movable connection such as a uni

Example Embodiment

[0035] Construction embodiment two, such as figure 2 Shown. An epitaxial wafer and a substrate form a pair of welding bodies. The structure of this embodiment is to improve production efficiency. The improved structure in the structure of the first embodiment can be used to weld multiple welding bodies at a time. This structure requires an extended positioning ring 204 and a thickened upper positioning disc 205 and lower positioning disc 203. The pressure member 207, the pressure member 206, and the electromagnetic coil 208 have the same structure as the first embodiment. The welding body composed of the epitaxial wafer 201 and the substrate 202 can be stacked and placed on the workbench for welding. Because the induction current of the electromagnetic coil heats the epitaxial wafer and the substrate, all the epitaxial wafers and the substrate have the same heating rate. The effect is as good as the single welding effect of the embodiment, which greatly improves the welding efficien

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PUM

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Abstract

The invention discloses a semiconductor epitaxial wafer press-welding method, the method does not need to heat the press-welding method through the way of thermal resistance heating, thus preventing the press-welding method in the way of thermal resistance heating from effecting ohmic contact performance of the epitaxial wafer because of thermal diffusion. The method avoids farthest deterioration of quality of epitaxial wafer caused by the way of thermal resistance heating. The invention comprises the following steps: location steps: placing welding epitaxial wafer and substrate on a worktable of folder device, causing welded surface of the epitaxial wafer and the substrate location-docking through a location device; electromagnetic-welding steps: connecting electromagnetic coil, imposing folder pressure on the epitaxial wafer and the substrate through the folder device of welding body, heating the press-welding method of the epitaxial wafer or the substrate through electromagnetic wave which is sent out by electromagnetic coil, thus causing the epitaxial wafer and the substrate press-welding together. The invention can increase the production rate because of fast heating rate and cooling rate obviously.

Description

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Claims

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Application Information

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Owner LATTICE POWER (JIANGXI) CORP
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