Method for preparing shadow mask type plasma display device front substrate medium layer
A plasma display and substrate medium technology, which is applied in cold cathode manufacturing, electrode system manufacturing, discharge tube/lamp manufacturing, etc., can solve the problems of yellowing and high production cost, achieve yellowing reduction, lower production cost, high durability The effect of pressure performance
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[0030] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0031] Such as figure 1 Shown, the shadow mask type plasma display front substrate dielectric layer manufacturing method of the present invention, it comprises the following steps:
[0032] (a). Clean the glass substrate 1, stir the glass paste 2 and the photosensitive silver paste 3 at high speed to defoam, cool to room temperature for use, and the glass substrate 1 is ordinary soda-lime glass;
[0033] (b). On the glass substrate 1, evenly coat the glass paste 2 with a thickness of 8-15 μm, then place it on a flat table and level it for 10-20 minutes to make the thickness of the glass paste 2 on the surface of the glass substrate 1 uniform, and bake Dry glass paste 2 volatilizes the low melting point solvent in the paste;
[0034] (c). Coat the photosensitive silver paste (3) with a thickness of 15-24 μm on the upper surface of the glass substrate 1 wi
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