Method for preparing shadow mask type plasma display device front substrate medium layer

A plasma display and substrate medium technology, which is applied in cold cathode manufacturing, electrode system manufacturing, discharge tube/lamp manufacturing, etc., can solve the problems of yellowing and high production cost, achieve yellowing reduction, lower production cost, high durability The effect of pressure performance

Inactive Publication Date: 2009-05-27
NANJING HUAXIAN HIGH TECH CO LTD
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patented technology allows for better control over how much light goes through an LCD screen compared to traditional methods like cathode ray tubes (CRT). It also improves its durability by preventing damage caused by external factors such as impact or pressure. Additionally, it prevents degradation due to heat generated inside when used at temperatures above 50 degrees Celsius. Overall, this new method provides improved image quality while maintaining low costs associated with producing these displays.

Problems solved by technology

This technical problem addressed in this patented text relates to improving the properties (such as resistance against breakdown) of the material called dielectrics placed over the front surface of Plasma Display panels while also maintaining their ability to transmit visual lights without losing its brightness or causing it to become too pale when exposed to higher temperatures required for activation.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing shadow mask type plasma display device front substrate medium layer
  • Method for preparing shadow mask type plasma display device front substrate medium layer
  • Method for preparing shadow mask type plasma display device front substrate medium layer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0031] Such as figure 1 Shown, the shadow mask type plasma display front substrate dielectric layer manufacturing method of the present invention, it comprises the following steps:

[0032] (a). Clean the glass substrate 1, stir the glass paste 2 and the photosensitive silver paste 3 at high speed to defoam, cool to room temperature for use, and the glass substrate 1 is ordinary soda-lime glass;

[0033] (b). On the glass substrate 1, evenly coat the glass paste 2 with a thickness of 8-15 μm, then place it on a flat table and level it for 10-20 minutes to make the thickness of the glass paste 2 on the surface of the glass substrate 1 uniform, and bake Dry glass paste 2 volatilizes the low melting point solvent in the paste;

[0034] (c). Coat the photosensitive silver paste (3) with a thickness of 15-24 μm on the upper surface of the glass substrate 1 wi

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for manufacturing a dielectric layer of a front substrate of a shadow mask plasma display panel, which comprises the following steps: coating dielectric paste on a display area of a glass substrate (1) distributed with electrode wires and firing the dielectric paste at low temperature to obtain a nontransparent dielectric layer (6), coating a dry film with light sensitive characteristic on the dielectric layer (6), and manufacturing mask figures (7) on the dry film by photoetching technology; and forming the dielectric layer (6) with the figures by selectively etching a dielectric material and the mask figures (7) through adopting a sand blasting process, wherein the dielectric figures only cover two sides and top end of the electrode wires on the display area of the panel. The method for manufacturing the dielectric layer of the shadow mask plasma display panel has the advantages of having low production cost, no need of high-temperature firing, good voltage-proof performance and high transmittance, and weakening panel yellowing.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner NANJING HUAXIAN HIGH TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products