Plating method for anti-reflection film with high transmittance and low reflectivity

A low-reflectivity, anti-reflection film technology, applied in sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve low transmittance, high reflectivity, AR film spectral curve can not meet customer requirements To achieve the effect of improving the transmittance, ensuring the service life, and avoiding the drift of the spectroscopic curve of the finished product

Active Publication Date: 2012-10-17
ANHUI JINGZHUO OPTICAL DISPLAY TECH CO LTD
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  • Summary
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  • Application Information

AI Technical Summary

Benefits of technology

This new technology improves on existing methods by allowing for better control over how well an antireflection coating (AR-film) works when exposed during manufacturing processes or after exposure time. By performing this process at high temperatures while maintaining complete airflow through it, there are no residue that remains even if any other layers have been added afterwards. Additionally, these techniques help prevent damage caused by external factors like rainwater from affecting their effectiveness. Overall, they improve the quality and lifespan of optical devices made up of them.

Problems solved by technology

The technical issue addressed in this patented text relates to improving coatings that prevent reflection from surfaces such as windows without damaging them during manufacturing processes. Current techniques involve adding multiple layers of materials like silicon dioxynitride (SIN), titanium nitrogen carbonyl sulfonate (TNSQ), tantala aluminum hydrate (TAHM). These approaches have limitations including poor adhesion between each other, uneven surface quality caused by variations in atmospher pressure levels across the entire coated area, reduced stability overtime, increased sensitivity towards light exposures, etc., leading to potential issues related to image clarity and color shifts associated with these traditional methods.

Method used

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  • Plating method for anti-reflection film with high transmittance and low reflectivity
  • Plating method for anti-reflection film with high transmittance and low reflectivity

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Embodiment Construction

[0033] Below in conjunction with accompanying drawing and embodiment the present invention will be further described.

[0034] A method for coating an anti-reflection film with high transmittance and low reflectivity, which is completed in a vacuum coating device by the following steps:

[0035] (1) Conventional vacuuming steps;

[0036] (2), conventional heating steps;

[0037] (3), Ar+O 2 The ion cleaning step;

[0038] (4) Coating SiO on the film 2 ;

[0039] (5) Etching in a full oxygen atmosphere, the pressure in the furnace can be the same as that of the coating stage, and the time is generally 2-5 minutes; at the same time, the pulse power is used as the ion activation treatment of the ion source power, so that under the action of the pulse electric field, the surface of the lens The vibration of the original low-priced ions intensifies, the degree of activity increases, and it is easier to further lose electrons, forming a strong and stable chemical bond structure wi

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Abstract

The invention relates to a plating method for an anti-reflection film with high transmittance and low reflectivity, wherein the method is the key technology of window glasses and filters of digital cameras, and the technology can further be applied in fields of radiation protection glasses, thermal insulation glasses, window glasses, solar energy utilization and the like. The method comprises the following steps in vacuum plating equipment: (1) pumping vacuum; (2) heating; (3) cleaning ions (Ar and O2); (4) plating SiO2; (5) etching under full oxygen atmosphere (only introducing O2); (6) plating TiO2; and (7) etching under full oxygen atmosphere (only introducing O2), and repeated performing the steps of (4)-(7) until the film system is completed. According to the present invention, the transmittance of the anti-reflection film in the optical wavelength region of 400-700 nm is improved without improvement of vacuum plating equipment requirements, and the reflectivity is further reduced.

Description

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Claims

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Application Information

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Owner ANHUI JINGZHUO OPTICAL DISPLAY TECH CO LTD
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