Wafer treatment device
A technology for processing devices and wafers, used in electrical components, bearing components, semiconductor/solid-state device manufacturing, etc., can solve problems such as base wear, and achieve the effect of improving service life, increasing stability, and avoiding relative motion
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[0021] The specific embodiments of the wafer processing apparatus provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0022] This specific embodiment provides a wafer processing apparatus, with figure 1 It is a top-view structural schematic diagram of a wafer processing apparatus in a specific embodiment of the present invention, with the attached figure 2 It is a schematic diagram of the cross-sectional structure of the wafer processing apparatus in the specific embodiment of the present invention. image 3 It is a schematic cross-sectional view of the base in the specific embodiment of the present invention.
[0023] like figure 1 , figure 2 , image 3 As shown, the wafer processing apparatus provided by this specific embodiment includes a base 10 for carrying wafers and a bearing nested in the base 10; the base 10 is in contact with the first bearing. The surface has a first connection structure, and the sec
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