Sedimentation type self-propagation reactor for compound containing silicon and nitride

A silicon nitride and reactor technology, applied in nitrogen compounds, chemical instruments and methods, inorganic chemistry, etc., can solve the problems of low reactor preparation yield and purity, energy consumption, energy consumption, etc., and achieve energy saving, partial Uniform, speed-adjustable results

Active Publication Date: 2019-08-23
宁夏时星科技有限公司
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The silicon nitride preparation reactors in the prior art are mainly closed reactors, some of which need to be carried out in a high-pressure state, which consumes energy and is unsafe; some require heating reactions, w

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0031] In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings. In the specification, the same or similar reference numerals indicate the same or similar components. The following description of the embodiments of the present invention with reference to the accompanying drawings is intended to explain the general inventive concept of the present invention, and should not be understood as a limitation to the present invention.

[0032] Throughout the specification, references to "one embodiment," "an embodiment," "an example," or "example" mean that a specific feature, structure, or characteristic described in conjunction with the embodiment or example is included in the present invention In at least one embodiment. Therefore, the phrases "in one embodiment", "in an embodiment", "an exam

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a sedimentation type self-propagation reactor for a compound containing silicon and nitride. The reactor comprises a furnace body, a solid material inlet, a gas inlet and a material outlet; the solid material inlet is arranged in the upper portion of the furnace body to guide a silicon-containing solid material to enter into the furnace body, a pulse pneumatic component isarranged on the solid material inlet, and the silicon-containing solid material is pushed into the furnace body by a pulse pneumatic method; the gas inlet is arranged in the side of the furnace body,and is configured to form a self-propagation reaction with the silicon-containing solid material in the furnace body after a nitrogen gas is introduced, wherein the reaction zone is corresponding to areaction zone in the furnace body; and the material outlet is arranged in the bottom of the furnace body, and is configured to output the compound containing the silicon and the nitride after the self-propagation reaction. The self-propagation reaction is carried out in the reactor provided by the invention, a heating member is not needed to be arranged to heat the furnace body, so that energy sources can be saved.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner 宁夏时星科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products