Photomask cleaning device and cleaning method thereof

A technology for cleaning devices and photomasks, which is applied to cleaning methods and utensils, cleaning methods using tools, cleaning methods using liquids, etc., can solve problems such as troublesome cleaning, hazards, exposure of operators, etc., and achieve the effect of being conducive to cleaning

Active Publication Date: 2022-02-08
威科赛乐微电子股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patented describes an improved device that uses several cleanings baths with various types of drugs or other substances to effectively clear away any unwanted material from surfaces such as masks during manufacture. These devices also have features like automation, detection of levels, rotation, etc., making it easier than previous methods requiring manual interventions. Additionally, they use special chemical liquors called purified water (PW) strips containing tiny nozzle arrangements to quickly flush off excessive materials without damaging sensitive areas inside them. Overall these improvements improve efficiency and quality control over processes used to produce masks.

Problems solved by technology

The technical problem addressed by this patented method relates to improving the removal of residual materials during manufacturing processes used when producing vertically cavities surface emitters (VCE). Existing solutions have limitations such as being laborious or potentially harmful due to their physical nature.

Method used

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  • Photomask cleaning device and cleaning method thereof
  • Photomask cleaning device and cleaning method thereof
  • Photomask cleaning device and cleaning method thereof

Examples

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Embodiment Construction

[0059] The present invention will be described in detail below in conjunction with specific embodiments.

[0060] Such as Figure 1-Figure 2 As shown, a photomask cleaning device of the present invention includes a body (not shown in the figure), a storage table 1, a liquid medicine soaking tank and a scrubbing tank 2 arranged in the body, and a tank connecting plate is fixedly installed in the body 11. The storage table 1, the liquid medicine soaking tank and the scrubbing tank 2 are all fixedly installed on the connecting plate 11 of the tank body. The medicine liquid soaking tank includes the first dipping tank 3 and the second dipping tank 4, and the first dipping tank 3 1. The second immersion tank 4 is an existing cleaning tank structure, and a support platform is arranged in the tank, and a first grasping module is fixedly installed above the liquid medicine soaking tank, and the first grasping module includes two first slides Rails 50, two first slide rails 50 are fixedl

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PUM

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Abstract

The invention discloses a photomask cleaning device and a cleaning method thereof, and relates to the technical field of photomask cleaning. The photomask cleaning device comprises a machine body, a storage table, a liquid medicine soaking tank and a scrubbing tank, the storage table, the liquid medicine soaking tank and the scrubbing tank are arranged in the machine body, a first grabbing module is fixedly installed above the liquid medicine soaking tank, a second grabbing module is fixedly installed above the scrubbing tank, a first scrubbing assembly is installed at the position corresponding to the liquid medicine soaking tank, and a second scrubbing assembly is fixedly mounted at the corresponding position of the scrubbing tank. According to the photomask cleaning device and the cleaning method thereof, a multi-groove automatic cleaning mode is adopted, a photomask can be cleaned for multiple times, the cleaning effect is better, the steps of manual operation are reduced, and a large amount of manpower is saved.

Description

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Claims

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Application Information

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Owner 威科赛乐微电子股份有限公司
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