The invention discloses a method for designing a multi-notch elliptical perfect vortex beam
mask plate. The method comprises the following steps: I, combining spiral phase factors Ev1 and Ev2 of different topological charges at an integer order in two elliptical coordinate systems so as to obtain Ev1+Ev2, and calculating a phase of Ev1+Ev2 so as to obtain angle (Ev1+Ev2); II, acquiring a spiral
phase factor Ev of a multi-notch elliptical perfect vortex, and combining the spiral
phase factor Ev with a elliptical cone lens complex
transmittance function ta so as to obtain a photoelectric field expression equation taEv, wherein the expression equation of Ev is Ev=exp[i*angle (Ev1+Ev2)], and i*angle refers to a function for calculating a phase of a complex number; III, according to a calculation holographic technique, enabling the photoelectric field expression equation taEv to interfere a
plane wave Ep, and performing modulo calculation and squaring, so as to obtain an interference lightintensity diagram, that is, the multi-notch elliptical perfect vortex beam
mask plate t. By adopting the
mask plate designed by using the method, an elliptical perfect vortex beam with random notchescan be generated.