4 results about "Frosted glass" patented technology

The invention discloses bright etched frosted glass and a preparation method thereof. The bright etched frosted glass has the reflectivity of 30% to 80% and has an etched layer with the thickness of 50nm to 200nm. The preparation method comprises the following preparation steps: (1) glass washing and drying; (2) pretreatment; (3) etching treatment; (4) aftertreatment. According to the bright etched frosted glass prepared by the preparation method, the surface of the glass has a relatively large amount of crystals which are arranged neatly, the frosted surface is fine and smooth, the finished product rate of preparation is high, the quality is stable, labor and time are saved, the process is simple and easy in operation, the frosting is uniform, smooth and delicate, and the bright etched frosted glass has a granular sensation, is tack-free to fingerprints and emit diamond-like gloss under sunshine irradiation, thereby having relatively high commercial value. In addition, the recovery of a majority of silicon tetrafluoride is achieved, the emission of silicon tetrafluoride gas is reduced, and the influence on environments and human bodies is lowered.

The invention discloses a high-temperature three-dimensional digital image related measurement system and method based on a single camera, and belongs to the field of digital image application. The system comprises a He-Ne laser, an industrial camera, a plane mirror II, a plane mirror I, a plane mirror III, a beam expander, a collimating mirror, frosted glass and the like. Green random speckles are sprayed on a measured object to serve as identification points I, random red speckles are generated by a He-Ne laser through frosted glass to serve as identification points II, the identification points I move along with movement of the measured object, and the identification points II do not move. Displacement fields are respectively calculated for speckle images of the identification points Iand II, and the difference value of the two displacement fields is used as an actual deformation field of the measured object, so the influence caused by thermal disturbance is greatly eliminated. Thesystem is used for measuring the three-dimensional morphology and the deformation field of an object in a high-temperature environment, eliminates the measurement error caused by thermal disturbance,and enables the result to be more accurate.