The invention belongs to the field of
semiconductor optoelectronic materials, and provides a
quantum well
green LED epitaxial structure with strain-reducing structure, comprising a
sapphire substratelayer arranged from bottom to top, a GaN low-temperature
nucleation layer, u-GaN layer, n-GaN lay, first strain reducing layer, InGaN / GaN
quantum well active region,
electron blocking layer and p-GaNlayer; The InGaN / GaN
quantum well active region comprises a GaN
barrier layer and a periodic structure located on the GaN
barrier layer, wherein each period of the periodic structure comprises a second strain reduction layer, an InGaN
quantum well layer, a third strain reduction layer and a GaN
barrier layer from bottom to top; The first strain reduction layer is an InGaN
monolayer or an InGaN / GaNsuperlattice, and the lattice constants of the second strain reduction layer and the third strain reduction layer are smaller than the InGaN
quantum well layer and larger than the GaN barrier layer.The invention weakens the polarization effect in the active region of the
green LED quantum well and improves the
radiation recombination probability of electrons and holes. The defect density in theactive region of InGaN / GaN
multiple quantum wells is reduced, which can be used in the
green LED field.