Continuous gas reaction device, and continuous dissolved gas reaction device
A technology of gas reaction and dissolved gas, applied in the chemical method of reacting liquid and gas medium, chemical/physical/physicochemical fixed reactor, transportation and packaging, etc., can solve the inefficiency of recycling process and equipment Reduced operating rate, increased maintenance costs, etc., achieved the effect of small and simple structure, reduced gas consumption, and reduced equipment scale
Inactive Publication Date: 2014-12-10
TAIHEIYO CEMENT CORP
View PDF6 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
This patented technology allows for efficient handling of materials that may become contaminated during manufacturing processes or when they come into contact with other components within an industrial facility' s environment. By connecting multiple common reaction vessels together serially, this new equipment has fewer parts than traditional systems while still being able to handle larger quantities efficiently. Additionally, it simplifies the design of these devices without requiring complex valve arrangements. Overall, this innovation improves the performance and cost effectiveness of chemical vapor deposition (CVD) technologies.
Problems solved by technology
The technical problem addressed in this patents relates to efficiently separating unwanted contaminants from useful or valuable material during recovery processes involving combustion ash containing various metals including iron oxide, zinc sulfate, manganese dioxide, magnesium hydroxyphosphorite, lithia bicarbonate, ceramics, glass fibers, plastics, rubber, metal alloys, organometallics, rare earth elements, lead compounds, copper, silver, tin, silicon, vanadium, tantalum, chroma nickel, selenium, tellurian actinides, pigments, lubricant oil residue, pharmaceutically active agents, pesticidal chemicals, dyes, polytetrafluoroethylene resins, polymer coatings, adhesives, paints, sealing gaskets, wires, sensors, filters, valves, actuators, electric motors, batteries, and electronic devices used within clean rooms where these recovering operations are performed frequently over time due to their high cost.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0030] Next, modes for implementing the present invention will be described in detail with reference to the drawings. In the following description, the case where incineration ash is slurried and processed using cement kiln exhaust gas (henceforth "exhaust gas") is demonstrated as an example.
[0031] figure 1 An embodiment of the continuous dissolved gas reactor of the present invention is shown, and the continuous dissolved gas reactor 1 is composed of a dissolution tank 2, a continuous gas reactor 3, a filter 5, and the like.
[0032] The dissolving tank 2 is equipped with stirring blades and the like in the tank, and is installed to add water W to the incineration ash A to form a solid slurry S and to dissolve the salt contained in the incineration ash A in the water.
[0033] The continuous gas reaction tank 3 is composed of four stages of reaction tanks 3A to 3D arranged in series. The reaction tanks 3A to 3D of each stage are equipped with a gas diffusion plate (not show
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more PUM
Login to view more Abstract
[Problem] To provide a continuous gas reaction device and the like having a small, simple structure, capable of continuous and high-volume processing of substances being processed, and capable of suppressing the generation and growth of scales in downstream processes. [Solution] A gas reaction device connecting reaction vessels (3A-3D) in a multiple-stage line, solid slurry (S) or liquid and gas (G1-G4) being caused to react in each reaction vessel, the gas reaction device being a continuous gas reaction apparatus (3) or the like that causes the diffused-air state of the gas to vary in each reaction vessel according to the reaction in each reaction vessel. The variation of the diffused-air state of the gas can be performed by varying at least one of the flow amount of the gas being diffused, the gas-bubble diameter, and the type. The solid slurry or the liquid and gas can also be used as the substance caused to react with each other to induce scales. When solid slurry or liquid must be generated outside the reaction vessel (3), a dissolution vessel (2) may be arranged at the stage before the reaction vessel (3A).
Description
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more Application Information
Patent Timeline
Login to view more Owner TAIHEIYO CEMENT CORP
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Try Eureka
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap