Antistatic device and substrate machining apparatus comprising the antistatic device

A processing device and anti-static technology, applied in the direction of stone processing equipment, fine working devices, circuits, etc., can solve the problems such as the increase of small scars, reduce the yield and influence, and achieve the effect of high-efficiency removal of static electricity.

Inactive Publication Date: 2019-02-12
MITSUBOSHI DIAMOND IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The technical effects are achieved through an improved electrostatic precipitator system for cleanliness purposes during manufacturing processes. This helps prevent unwanted particles or charges on surfaces while maintaining good electrical properties. Additionally, this technology can be used effectively at different stages within production lines without affecting its performance due to changes made over time.

Problems solved by technology

This technical issue addressed in this patented text relates to improving the efficiency at producing large area flexible electronic devices like plasma displays due to the presence of minute particles called flaws caused by handling damage to fragile materials used in these processes. These flakes can stick into the device's circuitry causing weakening its performance and reducing production yields. To address this challenge, various techniques have been developed including cleanliness measures, anti-fingerprint coats, and bondability control treatments involving adjustment of pressure between different layers within the device itself.

Method used

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  • Antistatic device and substrate machining apparatus comprising the antistatic device
  • Antistatic device and substrate machining apparatus comprising the antistatic device
  • Antistatic device and substrate machining apparatus comprising the antistatic device

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Embodiment Construction

[0039] Hereinafter, an embodiment of an antistatic device and a substrate processing apparatus incorporating the antistatic device according to the present invention will be described in detail with reference to the accompanying drawings.

[0040] figure 1 It is an overall schematic side view showing a substrate processing apparatus A including an antistatic device according to the present invention, figure 2 for its top view.

[0041] The substrate processing apparatus A has an upstream conveying part B, a scoring mechanism part and / or a cutting mechanism part C, and a downstream conveying part D. The upstream conveying part B linearly conveys the substrate W to be processed from upstream to downstream in a horizontal posture, and the The scribing mechanism part and / or the cutting mechanism part C processes a scribe line on the back surface of the conveyed substrate W in a direction perpendicular to the conveyance direction, and serves as a substrate processing part that d

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Abstract

The present invention provides an antistatic device capable of preventing dust from adhering to a substrate to obtain a product having excellent quality, and a substrate processing device having the antistatic device. The antistatic device adopts a structure having a cover (14, 16) that covers a surface of the non-processed substrate (W) in a space-separated manner, and an ionizer (20) disposed inthe cover (14, 16). By the ionizer (20), it is possible to prevent charging of the non-processed substrate (W), charging of dust entering the inside of the cover (14, 16), and preventing dust from adhering to the surface of the substrate, and by arranging the ionizer (20) in the sealed cover (14, 16), it is possible to improve the efficiency of static electricity removal.

Description

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Claims

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Application Information

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Owner MITSUBOSHI DIAMOND IND CO LTD
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